Method of controlling uniform distribution of ion implantation
A technology of ion implantation and uniformity, applied in the direction of discharge tubes, electrical components, circuits, etc., can solve problems such as inability to meet uniformity and parallelism, and inability to obtain broadband beams, and achieve simple structure, reliable functions, and easy control.
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[0019] Attached below figure 1 and attached figure 2 The present invention is further introduced, but not limited to the present invention.
[0020] like figure 1 As shown in the figure, a system for precisely controlling the uniform distribution of ion implantation involves high-precision multi-channel I / V acquisition and conversion, detection and correction of beam distribution density in the horizontal direction, beam parallelism detection, and vertical scanning control algorithm; the system is mainly composed of multi-coil It consists of adjusting magnet, multi-stage adjusting magnetic pole, moving Faraday cup, sampling Faraday cup, linear motor and PMAC motion control system.
[0021] The drawn broadband beam is adjusted by the coordination of the multi-coil adjusting magnet installed at the entrance of the wide beam parallel lens and the multi-stage adjusting magnetic poles installed at the exit of the wide beam parallel lens to ensure the uniformity and parallelism o...
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