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Method for preparing multi-wavelength silicon-based hybrid laser array by secondary exposure technology

A hybrid laser, secondary exposure technology, applied in lasers, laser parts, semiconductor lasers, etc., can solve the problems of complex process, achieve the effect of simple process, improved performance and short cycle

Inactive Publication Date: 2014-05-21
PEKING UNIV
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  • Abstract
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  • Application Information

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Problems solved by technology

In addition, this method of making the modulation grating on the silicon waveguide, that is, the optical coupling surface of the hybrid laser, not only solves the complex problem of making the grating on the multi-quantum well optical gain structure, but also makes the grating realize the hybrid laser. Better modulation effect improves the performance of the device

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  • Method for preparing multi-wavelength silicon-based hybrid laser array by secondary exposure technology
  • Method for preparing multi-wavelength silicon-based hybrid laser array by secondary exposure technology
  • Method for preparing multi-wavelength silicon-based hybrid laser array by secondary exposure technology

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Embodiment Construction

[0034]Combine below figure 2 , taking the DBR grating and the InP-based multi-quantum well optical gain structure array as an example to further describe the present invention in detail, the steps are as follows:

[0035] 1. First, the DBR grating is prepared on the silicon layer of the SOI wafer by using the double exposure technology. The specific process is as follows:

[0036] a) Spin-coat a layer of uniform photoresist on the silicon layer of the cleaned SOI sheet, such as figure 2 (a) Schematic diagram of the structure in side view.

[0037] b) According to the needs, calculate the parameters of the uniform grating: period The grating duty cycle is 50%. Then use laser holographic exposure technology to prepare a large area of ​​uniform grating stripes on the adhesive layer of the SOI sheet, but do not develop at this time, such as figure 2 (b) Schematic diagram of the side view structure.

[0038] c) Use the DBR grating photolithography plate as a mask to expose...

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Abstract

The invention discloses a method for preparing a multi-wavelength silicon-based hybrid laser array by secondary exposure technology. The method includes the steps: 1) preparing needed optical gratings on silicon layers of SOI (silicon on insulator) wafers by the aid of the secondary exposure technology; 2) preparing a plurality of silicon waveguides with different widths in a direction perpendicular to the optical gratings on the silicon layers of the SOI wafers to obtain a silicon waveguide array; 3) depositing a metal layer outside a set area of each silicon waveguide and two sides of the silicon waveguide on the corresponding SOI wafer to serve as a bonding area; 4) preparing a multiple quantum well optical gain structure array; 5) taking a surface which is closest to each optical gain area in the multiple quantum well optical gain structure array as a bonding surface, and aligning and bonding the optical gain area in the multiple quantum well optical gain structure array and optical coupled areas corresponding to the silicon waveguides in the silicon waveguide array to obtain the multi-wavelength silicon-based hybrid laser array. The method has the advantages of simple and mature process, lost cost and high reliability.

Description

technical field [0001] The invention relates to a silicon-based hybrid laser and a preparation method thereof in the field of silicon-based optoelectronic devices, in particular to a method for fabricating gratings on silicon waveguides with different widths by using a secondary exposure technology to realize a multi-wavelength silicon-based hybrid laser array. Background technique [0002] In recent years, with the development of optical interconnection and silicon-based optoelectronic integration technology, research on silicon-based light sources, especially silicon-based electrically pumped lasers, has attracted more and more attention. Recently, a method capable of realizing electrically pumped silicon-based lasers, the bonding method, has been proposed. This method is to bond the mature semiconductor laser structure on the silicon waveguide, and then couple the light in the laser structure into the silicon waveguide, thus realizing the silicon-based electric pump laser...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01S5/187H01S5/125
Inventor 李艳平陶利高智威冉广照
Owner PEKING UNIV