Method for preparing multi-wavelength silicon-based hybrid laser array by secondary exposure technology
A hybrid laser, secondary exposure technology, applied in lasers, laser parts, semiconductor lasers, etc., can solve the problems of complex process, achieve the effect of simple process, improved performance and short cycle
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[0034]Combine below figure 2 , taking the DBR grating and the InP-based multi-quantum well optical gain structure array as an example to further describe the present invention in detail, the steps are as follows:
[0035] 1. First, the DBR grating is prepared on the silicon layer of the SOI wafer by using the double exposure technology. The specific process is as follows:
[0036] a) Spin-coat a layer of uniform photoresist on the silicon layer of the cleaned SOI sheet, such as figure 2 (a) Schematic diagram of the structure in side view.
[0037] b) According to the needs, calculate the parameters of the uniform grating: period The grating duty cycle is 50%. Then use laser holographic exposure technology to prepare a large area of uniform grating stripes on the adhesive layer of the SOI sheet, but do not develop at this time, such as figure 2 (b) Schematic diagram of the side view structure.
[0038] c) Use the DBR grating photolithography plate as a mask to expose...
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