Method for fabricating multi-wavelength silicon-based hybrid laser array by double exposure technology
A hybrid laser and secondary exposure technology, which is applied to lasers, laser components, semiconductor lasers, etc., can solve problems such as complex processes, and achieve the effects of simple processes, improved performance, and short cycles
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[0034] Combine below figure 2, the present invention is further described in detail by taking DBR grating and InP-based multi-quantum well optical gain structure array as an example, and the steps are as follows:
[0035] 1. First, the DBR grating is prepared on the silicon layer of the SOI wafer by the double exposure technology. The specific process is as follows:
[0036] a) Spin-coat a uniform layer of photoresist on the silicon layer of the cleaned SOI wafer, such as figure 2 (a) The schematic side view of the structure is shown.
[0037] b) Calculate the parameters of the uniform grating as needed: period The grating duty cycle is 50%. Then, using the laser holographic exposure technology, a large area of uniform grating fringes is prepared on the adhesive layer of the SOI sheet, but it is not developed at this time, such as figure 2 (b) The schematic side view of the structure is shown.
[0038] c) Using the DBR grating lithography plate as a mask, UV exposur...
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