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Method for preparing tantalum disilicide coating

A tantalum disilicide coating technology, which is applied in the field of plasma spraying technology to prepare tantalum disilicide coatings, can solve the problems of small film thickness and many impurities, and achieve uniform microstructure, good chemical stability and low temperature resistance. The effect of oxidation properties

Inactive Publication Date: 2014-06-25
SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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Problems solved by technology

[0004] The present invention aims to overcome the problems of many impurity phases and small film thickness in the existing method for preparing tantalum disilicide coating. The present invention provides a method for preparing tantalum disilicide coating by plasma spraying technology

Method used

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  • Method for preparing tantalum disilicide coating
  • Method for preparing tantalum disilicide coating
  • Method for preparing tantalum disilicide coating

Examples

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Embodiment 1

[0036] Embodiment 1: select the TaSi whose particle size distribution is 15~50 microns and purity is 98wt% 2 Powder, using vacuum plasma spraying technology, select the process parameters listed in Table 3, prepare TaSi with graphite as the matrix 2 coating. XRD results ( figure 1 ) indicates that the coating consists of a single TaSi 2 Phase composition (PDF65-3548), free of impurity phases. cross-sectional morphology ( figure 2 ) shows that TaSi 2 The coating has a dense microstructure, and the coating thickness is 350-380 μm. The coating is peeled off from the graphite substrate, and after heat treatment at 500°C for 50 hours, the XRD pattern of the coating after heat treatment is the same as that of the original TaSi 2 The XRD patterns of the coating are basically the same ( image 3 ). It shows that the tantalum disilicide coating prepared by this method has good chemical stability and low temperature oxidation resistance.

[0037] Table 3 Vacuum plasma spraying...

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Abstract

The invention relates to a method for preparing a tantalum disilicide coating. The method comprises the step of spraying tantalum disilicide powder, which has the grain size of 10-120 microns and the purity higher than 95wt%, to the surface of a pretreated high-temperature resistant base material by adopting a vacuum plasma spraying process or low-pressure plasma spraying process, thereby obtaining the tantalum disilicide block material, wherein the plasma spraying process has the parameters as follows: the flow rate of plasma gas Ar is 30-50slpm, the flow rate of plasma gas H2 is 8-18slpm, the flow rate of powder carrying gas Ar is 1.5-5slpm, the spraying distance is 100-350mm, the spraying power is 30-58kW, the powder feeding speed is 8-30g / min, and the spraying pressure is 100-800mbar.

Description

technical field [0001] The invention relates to a method for preparing a tantalum disilicide coating, in particular to a method for preparing a tantalum disilicide coating through a plasma spraying technique. Background technique [0002] Tantalum disilicide has excellent properties such as high melting point, low resistivity, corrosion resistance, high temperature oxidation resistance, and good compatibility with silicon, carbon and other substrate materials. etc. have been extensively researched and applied in electric heating elements, high-temperature structural components, electronic devices, etc. [Cui Chunjuan, Zhang Jun, Liu Lin, Fu Hengzhi, Refractory metal silicide TaSi 2 Research progress in Materials Heat Treatment Technology, 39(2010) 72-74]. [0003] The preparation methods of tantalum disilicide block reported in the literature include: combustion synthesis (combustion systhesis, CS) or self-propagating high-temperature synthesis (self-propagating high-tempera...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C4/12C23C4/10C23C4/134C23C4/137
Inventor 牛亚然葛雪莲王忠赵君黄山松郑学斌丁传贤
Owner SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
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