Alignment type automatic de-molding ultraviolet nano impressing device and method

A technology of nanoimprinting and automatic demoulding, which is applied in the direction of optics, optomechanical equipment, instruments, etc., can solve the problems of small demoulding force, etc., and achieve the effects of reducing the generation of bubbles, less graphic replication defects, and easy demoulding

Inactive Publication Date: 2014-07-16
李宁 +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide an automatic demoulding nano-imprinting device with an alignment mechanism, which solves the problem of uniform distribution of compressive stress in the effective area, effectively achieves a small demoulding force, eliminates bubbles, and has a thin and uniform residual layer. Challenging work such as large-area release methods

Method used

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  • Alignment type automatic de-molding ultraviolet nano impressing device and method
  • Alignment type automatic de-molding ultraviolet nano impressing device and method
  • Alignment type automatic de-molding ultraviolet nano impressing device and method

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Embodiment Construction

[0044] The present invention will be further described in detail below in conjunction with the drawings and embodiments.

[0045] Such as Figure 1a-1b As shown, the embossing device of the present invention mainly includes: a marble shock absorber 1, a Z-axis platform 2, a directional guide rod base 3, a directional guide rod 4, a lower cavity fixed base plate 5, a lower cavity 6, an XYZT four-axis platform 7, a base Fixed platform 8, coated with anti-etching agent wafer 9, imprint template 10, imprint head 11, upper cavity 12, imprint head support base 13, ultraviolet light source 14, alignment mechanism 15, control System 16; wherein, the Z-axis platform 2 and the directional guide rod base 3 are fixed on the marble shock absorber 1, the guide rod 4 is connected to the directional guide rod base 3, and the other end of the Z-axis platform 2 is connected to the fixed bottom plate 5 of the lower chamber by the guide The rod 4 guides the Z axis, the XYZT four-axis platform 7 ...

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Abstract

The invention relates to an alignment type automatic de-molding ultraviolet nano impressing device and a method. The alignment type automatic de-molding ultraviolet nano impressing device mainly comprises following mechanisms: a marble shock absorption platform, a Z-axis platform, a directed guide rod base, a guide rod, a lower cavity fixing bottom plate, a lower cavity, an XYZT four-axis platform, a base fixing platform, a wafer coated with an anti-etching agent, an impressing template, an impressing head, an upper cavity, an impressing head supporting base, an ultraviolet light source and an alignment mechanism. With the adoption of a movement mechanism, an optical system, the alignment mechanism, a control system and the like, a pattern of the impressing template is transferred to the wafer coated with the anti-etching agent.

Description

technical field [0001] The invention relates to a nano-imprinting device that can be used in device manufacturing such as semiconductor devices, optical devices and biological products, relates to mask and substrate alignment, LED ultraviolet cold light source curing nano-imprinting device, belongs to micro-nano manufacturing and device manufacturing technology field. Background technique [0002] With the advancement of science and technology and the rapid development of semiconductor integrated circuit technology, the resolution of ordinary optical lithography has reached its limit. Following this, alternatives to ordinary optical lithography have emerged in recent years: extreme ultraviolet lithography (EUV) and nanoimprinting (NIL). Extreme ultraviolet lithography technology uses extreme ultraviolet light with a wavelength of 11-13nm, and adopts a high-precision reflective optical system to avoid strong light absorption in the refraction system. How to achieve a short-w...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
Inventor 不公告发明人
Owner 李宁
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