Preparation method of nickel-based catalyst nanometer film
A technology of nickel-based catalysts and nano-films, applied in chemical instruments and methods, physical/chemical process catalysts, metal/metal oxides/metal hydroxide catalysts, etc., can solve the problems of difficulty in preparing porous molds and high costs, and achieve Reduce time and cost, achieve controllable manufacturing, and simple preparation process
Inactive Publication Date: 2014-08-20
CHINA UNIV OF MINING & TECH
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But above-mentioned method all has respective defect, as adopting photolithography to prepare catalyst thin film, although effect is good but cost is high; And plasma bombardment method is suitable for PECVD to prepare aligned carbon nanotube thin film; The preparation of porous mold itself is a difficult problem. question
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[0024] The present invention will be further described below in conjunction with the accompanying drawings.
[0025] A method for preparing nickel-based catalyst nano-films. First, magnetron sputtering technology is used to deposit a certain thickness of nickel nano-films on the surface of a substrate to form a film sample; The film is textured, and the nickel nano-film is processed into a regularly distributed pattern; finally, the textured film sample is placed in a tube furnace, and ammonia gas is introduced to etch the nickel nano-film. The temperature in the tube furnace can melt the nickel nanofilm. Since the thermal expansion coefficient of the nickel nanofilm is different from that of the substrate, it will start to shrink with the texture pattern as the boundary under the action of surface tension. As the etching time increases, the nickel nanofilm Nanofilms are further shrunk into nickel-based nanoparticles. In the method, nano-scale nickel-based catalyst particles ...
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The invention discloses a preparation method of a nickel-based catalyst nanometer film. The preparation method comprises the following steps: firstly, depositing a nickel nanometer film with certain thickness on the surface of a substrate by using a magnetron sputtering technology; then placing a film sample on a three-dimensional movement platform, texturing the nickel nanometer film by using laser interference, processing the nickel nanometer film into regularly distributed patterns; finally, putting the textured film sample into a tube furnace, introducing ammonia to etch the nickel nanometer film, and finally shrinking on the surface of the nickel nanometer film to form nickel-based nanometer particles. According to the preparation method, a laser interference pattern is used for replacing a conventional photoetching mask plate, the time and cost of manufacturing the mask plate are reduced, the nickel-based film is processed by laser interference so that the uniformity of particle distribution during etching with ammonia is facilitated; through changing the interference pattern size and the introduction flow velocity of ammonia, the particle size can be controlled, and the particle size and the controllable density degree are realized.
Description
technical field [0001] The invention relates to a preparation method of a nickel-based catalyst nano film, in particular to a preparation method of a nickel-based catalyst nano film with controllable particle size and uniform distribution. Background technique [0002] Carbon nanotubes have attracted the attention and research of scholars all over the world because of their peculiar structure, huge specific surface area, surface hydrophobicity, adsorption, mechanics and electricity, and have been widely used in hydrogen storage materials, information storage and biomedical fields. The oriented carbon nanotube film is to align the carbon nanotubes along the axial direction, so that the arrangement of the carbon nanotubes is changed from disorderly to orderly, and the mechanical, thermal and electrical properties of the carbon nanotubes are better exerted. [0003] Due to the large aspect ratio of carbon nanotubes, bending and winding are inevitable during the growth process....
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Login to View More IPC IPC(8): B01J23/755C23C14/35C23C14/58C23F1/12
Inventor 杨海峰陈天驰唐玮杨建华郝敬宾朱华
Owner CHINA UNIV OF MINING & TECH