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Calibration device for flat capacitive displacement sensor

A technology of displacement sensor and plate capacitor, which is applied in the field of sensor calibration, can solve the problems of small calibration stroke and limited sensor calibration accuracy, and achieve the effect of improving performance, easy operation, and small Abbe error and cosine error

Inactive Publication Date: 2017-07-14
CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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AI Technical Summary

Problems solved by technology

[0005] In order to overcome the shortcomings of the prior art that the calibration stroke of the calibration device is small; continuous real-time calibration cannot be performed; and the calibration accuracy of the sensor is limited, the present invention provides a calibration device for a flat capacitive displacement sensor, which can simulate real-time use in thousands of environments. The first-class clean room calibrates the flat capacitive displacement sensor, and obtains the sensor's resolution, linearity and repeated measurement accuracy indicators

Method used

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  • Calibration device for flat capacitive displacement sensor
  • Calibration device for flat capacitive displacement sensor
  • Calibration device for flat capacitive displacement sensor

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Embodiment Construction

[0014] The present invention will be described in further detail below in conjunction with the accompanying drawings.

[0015] Such as Figure 1-2 As shown, the calibration device of the flat plate capacitive displacement sensor includes a micro-displacement adjustment mechanism 3, which is installed on the air-floating vibration isolation platform; the measuring beam emitted by the laser interferometer 1 passes through the light hole on the micro-displacement adjustment mechanism 3 3-1 is incident on the beam splitter 4, the beam splitter 4 is connected to the beam splitter support adjustment seat 5, and the beam splitter support adjustment seat 5 is connected to the beam splitter support adjustment seat interface 3-2 on the micro-displacement adjustment mechanism 3; refer to reflection The mirror 6 is connected with the beam splitter 4, and is on the same straight line as the optical axis of the laser interferometer 1; the measuring mirror 2 is connected with the measuring m...

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Abstract

A calibration device for a flat plate capacitive displacement sensor belongs to the technical field of sensor calibration. In order to overcome the shortcomings of the prior art that the calibration stroke of the calibration device is small; continuous real-time calibration cannot be performed; and the calibration accuracy of the sensor is limited; the light emitted by the laser interferometer passes through the micro After the displacement adjustment mechanism, it is incident on the beam splitter; the beam splitter is installed on the micro-displacement adjustment mechanism; the reference mirror is connected to the beam splitter, and is on the same line as the optical axis of the single-axis laser interferometer; the measurement mirror is installed on the micro-displacement adjustment mechanism The left end of the guide mechanism, adjust the measuring reflector and the beam splitter through the light hole on the same line; the front end of the guide mechanism is provided with the measured surface of the sensor, and the flat capacitive displacement sensor is installed in the middle of the sensor support seat; the two ends of the support seat are respectively installed to the bosses on both sides of the micro-displacement adjustment mechanism; a driver push rod is installed at the left end of the driver, and the driver push rod pushes the guide mechanism of the micro-displacement adjustment mechanism.

Description

technical field [0001] The invention relates to a calibration device for a flat plate capacitance displacement sensor, which belongs to the technical field of sensor calibration. Background technique [0002] The lithography projection objective lens is the key equipment in the ultra-large / very large-scale integrated circuit manufacturing process. In recent years, with the continuous reduction of the line width of the integrated circuit, the resolution of the lithography projection objective lens has gradually improved. The continuous improvement of the overall performance of optical equipment requires that the projection objective lens has a higher numerical aperture (NA) and smaller system wave aberration. However, there are errors in the detection of the optical components of the objective lens and the integration of the system assembly. In order to achieve the ideal compensation effect, the position of the optical components needs to be detected during the micro-displace...

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B7/02
Inventor 张德福郭抗李显凌李朋志
Owner CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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