LDMOS ESD device
A device and well region technology, applied in semiconductor devices, electric solid state devices, semiconductor/solid state device components, etc., can solve the problems of current rise, small electrostatic discharge current, high ESD protection level, etc., to improve electrostatic discharge current, Effect of reduced turn-on voltage, high ESD protection level
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[0019] The first implementation mode is: a first P+ doped region and a second P+ doped region are respectively formed under the first N+ doped region and the second N+ doped region;
[0020] The second implementation manner is: a third P+ doped region is formed under the third N+ doped region;
[0021] The third implementation mode is a combination of the first implementation mode and the second implementation mode, that is, a first P+ doping region and a second N+ doping region are respectively formed under the first N+ doping region and the second N+ doping region. A third P+ doped region is formed under the P+ doped region and the third N+ doped region.
[0022] Any one of the first and second implementations can solve the technical problems to be solved by the present invention, and the third implementation is the optimal implementation, which can further increase the electrostatic discharge current per unit area and obtain higher ESD protection Level.
[0023] Such as ...
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