Plasma texturing method of AZO film of film solar cell

Abstract

The invention relates to the field of semiconductor industry, and in particular relates to a plasma texturing method of an AZO film of a film solar cell. The method is characterized in that the advantages of physical etching and chemical etching of the plasma etching method and high regulation performance of the etching degree and other advantages are utilized to etch the AZO film of the film solar cell. With the adoption of the method, the effect of wet etching can be reached; meanwhile, any corrosive solution is not used, so that the environmental pollution caused by improper handling of reaction solution can be avoided; the heating temperature, flow rate of inlet air, power and frequency of a radio source, and etching time of a substrate rack are controlled to improve the etching controllability; compared with the sputtering-depositing texturing type AZO film of which the particle energy is limited and obvious texturing effect is not reached, the AZO film has the advantage that a good etching effect can be reached; the texturing method of the AZO film of the film solar cell has the advantages of being high in light trapping structure effect, high in etching controllability and free of pollution; therefore, the method can be applied to the technology for improving the converting efficiency of a solar cell.

Description

technical field [0001] The invention relates to the field of semiconductor industry, especially solar cells, in particular to a plasma texturing method for AZO thin films of thin-film solar cells. Background technique [0002] With the intensification of energy shortage and environmental pollution, all countries are stepping up the pace of development of the photovoltaic industry. At present, in order to solve the problems of high cost and low efficiency of solar cells, various new processes and technologies are applied to the preparation of cells. In the technology of improving the conversion efficiency of solar cells, optical optimization is an important optimization technology, and its purpose is to increase the incident light intensity or photon flux inside the solar cell. Increasing photon flux means that solar cells can use incident photons more effectively, increase photogenerated current, achieve higher conversion efficiency, and reduce the cost of photovoltaic powe...

AI Technical Summary

Problems solved by technology

Wet etching has the advantages of large-area substrate processing and fast etching speed. However, because the etching speed is too fast, it is not easy to control the etching process. At the same time, the use of acid or alkali solution is likely to cause environmental pollution.

For the method of directly preparing textured AZO thin films, the texturing effect is not obvious due to the limited particle energy during sputtering deposition.

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