A kind of preparation method of y2-xybxo3 down conversion luminescent film
A light-emitting film, y2-xybxo3 technology, applied in the field of solar cells, can solve the problems of low production efficiency and high cost, and achieve the effect of low cost, high coating efficiency, and easy large-area industrial coating
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Embodiment 1
[0028] Fabrication of Y in silico 1.995 Yb 0.005 o 3 Single layer down conversion film:
[0029] 1) Weigh 530.7456g of yttrium acetate and 1.7509g of ytterbium acetate respectively, and then dissolve them in 3853ml of methanol (the concentration of the total amount of yttrium acetate and ytterbium acetate in methanol is 0.5 mol / liter), and stir until transparent;
[0030] 2) Add 444.471g of propionic acid to the solution obtained in 1) (the molar ratio of the carboxyl group in propionic acid to the total amount of yttrium acetate and ytterbium acetate is 3), stir and age for 3h;
[0031] 3) Plating the aged solution in 2) on a silicon wafer at a pulling speed of 50 mm / min, and drying at a temperature of 60° C. for 15 minutes to obtain a precursor film;
[0032] 4) The precursor film obtained in 3) is heat-treated on a silicon wafer at 950° C. for 5 minutes to obtain.
Embodiment 2
[0034] Fabrication of Y in silico 1.99 Yb 0.01 o 3 Two-layer down conversion film:
[0035] 1) Weigh 529.4154g of yttrium acetate and 3.5017g of ytterbium acetate respectively, and then dissolve them in 1913ml of methanol (the concentration of the total amount of yttrium acetate and ytterbium acetate in methanol is 1 mol / liter), and stir until transparent;
[0036] 2) Add 461.2013g polyacrylic acid to the solution obtained in 1) (the molar ratio of the carboxyl group in the polyacrylic acid to the total amount of yttrium acetate and ytterbium acetate is 3.2), stir and age for 24h;
[0037] 3) Plating the aged solution in 2) on a silicon wafer at a pulling speed of 100 mm / min, and drying at a temperature of 70° C. for 10 minutes to obtain a precursor film;
[0038] 4) The precursor film obtained in 3) is heat-treated on a silicon wafer at 850° C. for 10 minutes to obtain.
[0039] 5) Repeat steps 3) and 4) once.
Embodiment 3
[0041] Fabrication of Y in silico 1.85 Yb 0.15 o 3 Four-layer down conversion film:
[0042] 1) Weigh 492.1701g of yttrium acetate and 52.5261g of ytterbium acetate respectively, and then dissolve them in 19913ml of methanol (the concentration of the total amount of yttrium acetate and ytterbium acetate in methanol is 0.1 mol / liter), and stir until transparent;
[0043] 2) Add 492.2181g of propionic acid to the solution obtained in 1) (the molar ratio of the carboxyl group in propionic acid to the total amount of yttrium acetate and ytterbium acetate is 3.3), stir and age for 48h;
[0044] 3) Plating the aged solution in 2) on a silicon wafer at a pulling speed of 150 mm / min, and drying at a temperature of 85° C. for 5 minutes to obtain a precursor film;
[0045] 4) The precursor film obtained in 3) is heat-treated on a silicon wafer at 800° C. for 20 minutes to obtain.
[0046] 5) Repeat steps 3) and 4) three times.
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