Silicate glass substrate for flat-panel display

A silicate glass and flat display technology, which is applied in the field of organic electroluminescent display (OEL) substrate glass and alkaline earth aluminum borosilicate glass components, can solve the problem of low electron mobility, high aperture ratio, and influence on the backlight source. Effective utilization and other issues to achieve the effect of high strain point, production cost reduction, raw material cost control

Inactive Publication Date: 2015-01-14
TUNGHSU GRP
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Problems solved by technology

Silicon-based TFT can be divided into amorphous silicon (a-Si) TFT, polycrystalline silicon (p-Si) TFT and single crystal silicon (SCS) TFT, among which amorphous silicon (a-Si) TFT is currently the mainstream TFT-LCD application However, the active matrix TFT fabricated on the amorphous silicon film has to make the device area slightly larger due to its low electron mobility, so it occupies a large proportion of the small pixel area, making the pixel The aperture ratio (effective pixel area / total pixel area) is only about 70%
Seriously affects the effective use of the backlight source, and although the passive liquid crystal display cannot display video images, its aperture ratio is high (up to 100% regardless of the pixel interval), and the mutual competition in the aperture ratio has led people to develop the aperture A polysilicon TFT active matrix with an efficiency of more than 80%, that is, P-TFT-LCD

Method used

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  • Silicate glass substrate for flat-panel display

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Embodiment Construction

[0022] The silicate glass substrate used for flat panel display, the composition of each chemical component in the raw material is as follows in molar percentage:

[0023] SiO 2 64~70%,

[0024] Al 2 o 3 12~16%,

[0025] B 2 o 3 3~8.5%,

[0026] CaO 6.5~9.5%,

[0027] SrO 2.5~5%,

[0028] SnO 0.02~0.1%.

[0029] In terms of molar percentage, wherein said SrO / (SrO+CaO)2 o 3 / (SrO+CaO)>1.0. It can greatly increase the strain point, and more importantly, reduce the melting temperature of the glass at the same time.

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Abstract

The invention discloses a silicate glass substrate for a flat-panel display. The glass substrate comprises the following components by molar percent: 64-70% of SiO2, 12-16% of Al2O3, 3-8.5% of B2O3, 6.5-9.5% of CaO, 2.5-5% of SrO and 0.02-0.1% of SnO. The glass substrate disclosed by the invention is the silicate glass substrate for the flat-panel display having the advantages of relatively high strain point, relatively low melting temperature, relatively low liquidus temperature and environmental friendliness, and is especially applicable for glass substrates for low-temperature polysilicon thin-film transistor liquid crystal displays (LTPSTFT-LCD) and glass substrates for organic electroluminescence (OEL) displays.

Description

technical field [0001] The invention belongs to the field of glass manufacturing, and relates to an alkaline-earth aluminoborosilicate glass component, which can be widely used in the production of glass substrates for flat-panel displays, and is especially suitable for low-temperature polysilicon thin-film transistor liquid crystal display (LTPS TFT-LCD) substrate glass and Organic electroluminescent display (OEL) substrate glass. Background technique [0002] With the rapid development of the flat panel display industry, the demand for various display devices is increasing, such as active matrix liquid crystal display (AMLCD), organic light emitting diode (OLED) and active matrix liquid crystal display (LTPS TFT- LCD) devices, which are based on thin-film transistor (TFT) technology using thin-film semiconductor materials. Silicon-based TFT can be divided into amorphous silicon (a-Si) TFT, polycrystalline silicon (p-Si) TFT and single crystal silicon (SCS) TFT, among whic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/091
CPCC03C3/091
Inventor 张广涛闫冬成刘泽文沈玉国李俊锋刘文泰
Owner TUNGHSU GRP
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