Silicate glass substrate for flat-panel display
A silicate glass and flat display technology, which is applied in the field of organic electroluminescent display (OEL) substrate glass and alkaline earth aluminum borosilicate glass components, can solve the problem of low electron mobility, high aperture ratio, and influence on the backlight source. Effective utilization and other issues to achieve the effect of high strain point, production cost reduction, raw material cost control
A silicate glass and flat display technology, which is applied in the field of organic electroluminescent display (OEL) substrate glass and alkaline earth aluminum borosilicate glass components, can solve the problem of low electron mobility, high aperture ratio, and influence on the backlight source. Effective utilization and other issues to achieve the effect of high strain point, production cost reduction, raw material cost control
CN104276754AInactive Publication Date: 2015-01-14TUNGHSU GRP
Image
Smart Image Click on the blue labels to locate them in the text.
Smart ImageViewing Examples
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0022] The silicate glass substrate used for flat panel display, the composition of each chemical component in the raw material is as follows in molar percentage:
[0023] SiO 2 64~70%,
[0024] Al 2 o 3 12~16%,
[0025] B 2 o 3 3~8.5%,
[0026] CaO 6.5~9.5%,
[0027] SrO 2.5~5%,
[0028] SnO 0.02~0.1%.
[0029] In terms of molar percentage, wherein said SrO / (SrO+CaO)2 o 3 / (SrO+CaO)>1.0. It can greatly increase the strain point, and more importantly, reduce the melting temperature of the glass at the same time.
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More PUM
| Property | Measurement | Unit |
|---|---|---|
| strain point | aaaaa | aaaaa |
| strain point | aaaaa | aaaaa |
| liquidus temperature | aaaaa | aaaaa |
Login to View More
Abstract
The invention discloses a silicate glass substrate for a flat-panel display. The glass substrate comprises the following components by molar percent: 64-70% of SiO2, 12-16% of Al2O3, 3-8.5% of B2O3, 6.5-9.5% of CaO, 2.5-5% of SrO and 0.02-0.1% of SnO. The glass substrate disclosed by the invention is the silicate glass substrate for the flat-panel display having the advantages of relatively high strain point, relatively low melting temperature, relatively low liquidus temperature and environmental friendliness, and is especially applicable for glass substrates for low-temperature polysilicon thin-film transistor liquid crystal displays (LTPSTFT-LCD) and glass substrates for organic electroluminescence (OEL) displays.
Description
technical field [0001] The invention belongs to the field of glass manufacturing, and relates to an alkaline-earth aluminoborosilicate glass component, which can be widely used in the production of glass substrates for flat-panel displays, and is especially suitable for low-temperature polysilicon thin-film transistor liquid crystal display (LTPS TFT-LCD) substrate glass and Organic electroluminescent display (OEL) substrate glass. Background technique [0002] With the rapid development of the flat panel display industry, the demand for various display devices is increasing, such as active matrix liquid crystal display (AMLCD), organic light emitting diode (OLED) and active matrix liquid crystal display (LTPS TFT- LCD) devices, which are based on thin-film transistor (TFT) technology using thin-film semiconductor materials. Silicon-based TFT can be divided into amorphous silicon (a-Si) TFT, polycrystalline silicon (p-Si) TFT and single crystal silicon (SCS) TFT, among whic...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More Application Information
Patent Timeline
14 Jan 2015
Publication
CN104276754A
- IPC
- C03C3/091
- CPC
- C03C3/091
- Inventors
- 张广涛; 闫冬成