Alkali-free alumina silicate glass with high strain point

A silicate glass, high-strain technology, used in the field of substrate glass for flat panel displays, alkali-free aluminosilicate glass

Inactive Publication Date: 2010-12-15
TUNGHSU GRP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] But so far, there is no glass substrate that is fully suitable for low-temperature polysilicon (LTPS, LowTemperature Poly-Silicon) technology, and is used in the substrate glass of glass integrated system (SOG, System on Glass)

Method used

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  • Alkali-free alumina silicate glass with high strain point

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0034] First, select the raw material according to the glass composition of Example 1 in Table 1, the raw material requirements, quartz sand (the 150 μm sieve is less than 1%, the 45 μm sieve is less than 30%, Fe 2 o 3 content less than 0.01wt%), aluminum hydroxide or aluminum oxide (average particle size 50 μm), calcium carbonate (average particle size 250 μm), strontium nitrate or strontium carbonate (average particle size 50 μm), zinc oxide (average particle size 60 μm sieve 1% or less), zirconium silicate or zirconium dioxide (the average particle size of 45 μm is 1% or less), and the alkali metal oxide content in the raw material is less than 0.1%. And the Fe in the glass raw material 2 o 3 Strictly controlled, the finished glass Fe 2 o 3 The content is less than 150PPm. The clarifying agent is tin oxide, and its ingredients meet the chemical composition of the glass in Table 1, and then it is melted at 1570° C. for 24 hours using a platinum crucible. After melting,...

Embodiment 2

[0036] The actual composition of the glass refers to Example 2 in Table 1. The same raw materials and raw material requirements as in Example 1 are used, and the same melting process system and test conditions are adopted. Table 1 shows the basic properties of the samples. (1) The density is 2.68g / cm 3 ; (2) The average linear expansion coefficient of 30-380°C is 32.4×10 -7 / °C; (3) Strain point T st 750°C; (4) Annealing point T a 800°C; (5) Working point T w (6) Elastic modulus is 89GPa; (7) Hydrofluoric acid buffer corrosion resistance 0.33mg / cm 2 .

Embodiment 3

[0038] Refer to Example 3 in Table 1 for the actual composition of the glass, use the same raw materials and raw material requirements as in Example 1, and adopt the same melting process system and test conditions. Table 1 shows the basic properties of the samples. (1) The density is 2.66g / cm 3 ; (2) The average linear expansion coefficient of 30-380°C is 31.3×10 -7 / °C; (3) Strain point T st is 758°C; (4) annealing point T a is 804°C; (5) Working point T w (6) Elastic modulus is 88GPa; (7) Hydrofluoric acid buffer corrosion resistance 0.31mg / cm 2 .

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Abstract

The invention relates to alkali-free alumina silicate glass with a high strain point, which comprises the following chemical components: 55-70 wt.% of SiO2, 15-25 wt.% of Al2O3, 2-11 wt.% of CaO, 1-6 wt.% of SrO, 3-10 wt.% of ZnO and 1-7 wt.% of ZrO2. The glass does not contain alkali metal oxides, heavy metal oxides, boron oxide or hazardous elements and has the advantages of high strain point, low expansion coefficient, high modulus of elasticity, low founding temperature and the like, is suitable to substrate glass of an SOC (System on Glass), especially suitable to substrate glass for a panel display.

Description

technical field [0001] The invention relates to an alkali-free aluminosilicate glass with high strain point, low expansion coefficient, high elastic modulus, no alkali metal oxide and no boron oxide, which is suitable for preparing SOG substrate glass; the invention relates to A substrate glass for a flat panel display. Background technique [0002] Liquid crystal display has the advantages of low driving voltage and power consumption, small size, light weight, etc., and has become the mainstream technology of flat panel display. In liquid crystal display technology, low temperature polysilicon (LTPS, LowTemperature Poly-Silicon) is the manufacturing process of a new generation of thin film transistor liquid crystal display (TFT-LCD). LTPS technology makes mobile electronic devices thinner, more powerful and brighter. , The reaction speed is faster, but the preparation temperature of the usual polysilicon preparation process will be higher than 600 ° C, and the ordinary gla...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C3/087
Inventor 田英良张磊孙诗兵
Owner TUNGHSU GRP
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