Fixed abrasive polishing cloth adopting nanometer aggregation structure adhesive

A polishing cloth and nanomaterial technology, applied in abrasives, metal processing equipment, manufacturing tools, etc., can solve the problems of difficult pH control, easy to scratch the processed surface, affecting the surface processing quality, etc., to achieve low mechanical removal effect, improve Chemical removal effect, effect of reducing environmental burden

Active Publication Date: 2015-01-28
TIANJIN VOCATIONAL INST
View PDF7 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The particle size is usually submicron. Compared with the processing surface of the current nano-polishing fluid, it is easy to scratch the processing surface and affect the surface processing quality
In addition, in order to improve the chemical removal effect, the fixed abrasive polishing cloth usually needs to be used together with a chemical solution. For example, the Si substrate usually uses an alkaline aqueous solution with a pH of 10, which is easy to interact with CO in the air during processing. 2 Reaction, pH value is not easy to control

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Fixed abrasive polishing cloth adopting nanometer aggregation structure adhesive
  • Fixed abrasive polishing cloth adopting nanometer aggregation structure adhesive
  • Fixed abrasive polishing cloth adopting nanometer aggregation structure adhesive

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The present invention will be further described in detail below through the specific examples, the following examples are only descriptive, not restrictive, and cannot limit the protection scope of the present invention with this.

[0025] A fixed abrasive polishing cloth adopting a nano aggregate structure abrasive, which is composed of a polishing cloth base material 5 and a fixed abrasive uniformly added to the polishing cloth base material, the fixed abrasive is a nano aggregate structure abrasive 6, and the nano aggregate structure abrasive is Micron-sized spherical abrasive aggregated by nano-particles 7.

[0026] The base material of the polishing cloth is a viscoelastic material such as polyurethane. The addition rate of the nano-aggregated abrasive to the polishing cloth base material is 6 vol%-50 vol%, and the porosity is 10 vol%-50 vol%. Nanoparticles have a particle size of 1-80nm, with a pore volume of 0.1cm 3 / g-5cm 3 The aggregation density of / g aggre...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
porosityaaaaaaaaaa
particle diameteraaaaaaaaaa
pore sizeaaaaaaaaaa
Login to view more

Abstract

The invention relates to fixed abrasive polishing cloth adopting a nanometer aggregation structure adhesive. The fixed abrasive polishing cloth is characterized by consisting of a polishing cloth substrate and an abrasive uniformly distributed in the polishing cloth substrate, wherein the fixed abrasive is the nanometer aggregation structure adhesive; the nanometer aggregation structure adhesive is a micro-grade spherical abrasive formed by aggregating nanometer particles. The adopted nanometer aggregation structure adhesive is the micro-grade spherical abrasive formed by aggregating the nanometer particles, so that the nanometer particles can be prevented from easily falling into the polishing cloth substrate made of a sticky elastic material, and the machining effect is brought into full play while high surface smoothness is ensured.

Description

technical field [0001] The invention relates to a polishing tool for precise machining of the surface of hard and brittle materials, in particular to a fixed abrasive polishing cloth using nano-agglomerated abrasives and a processing method thereof. Background technique [0002] At present, various microelectronic substrate materials (such as substrates of Si, SiC, glass, etc.), SiO 2 The ultra-precision processing of insulating films and microelectronic components generally uses nano-abrasive polishing fluids, and the most commonly used is nano-silicon oxide polishing fluids. However, due to a series of environmental problems caused by the use of polishing fluid (free abrasive), the processing of fixed abrasive has been paid more and more attention. Among fixed abrasive tools, fixed abrasive polishing cloths are the easiest to achieve ultra-precision surfaces. The fixed abrasive polishing cloth is mainly composed of a polishing cloth substrate and abrasives fixed in the s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B24D11/00
CPCB24D11/00
Inventor 高绮谷泰弘
Owner TIANJIN VOCATIONAL INST
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap