Wet chemical treatment method for crystalline silicon solar cells by performing texturing and cleaning step by step

Abstract

The invention discloses a crystalline silicon solar cell wet chemical treatment method for performing texture surface making and cleaning steps. The method comprises the following steps: (1) providing a pre-treated silicon slice; (2) pre-cleaning the silicon slice by adopting a first cleanout fluid to remove granular impurities and pollution on the surface of the silicon slice; (3) polishing the silicon slice by adopting a polishing corrosive liquid to corrode a medicinal damage layer on the surface; (4) adopting a texture surface making solution to perform texture surface processing on the silicon slice to form a textured surface on the surface of the silicon slice; (5) cleaning the silicon slice by adopting a second cleanout fluid to remove surface metal ions and neutralize alkali impurities, so that the chemical residues on the surface of the silicon slice are reduced; and (6) treating the silicon slice by adopting an oxidation corrosion liquid to remove the oxide layer and to form a hydrophobic drying structure on the surface of the silicon slice. The textured silicon slice can be stored for a long time, the surface cleanliness and the antireflection effects of the textured silicon slice reach relatively high level, the production time is greatly reduced and the production efficiency is improved.

Description

technical field [0001] The invention relates to a method for wet chemical treatment of crystalline silicon solar cells by performing texturing and cleaning step by step. Background technique [0002] At present, the existing wet chemical treatment methods for crystalline silicon solar cells are generally composed of silicon wafer pretreatment, polishing, texturing, RCA cleaning, drying and other processes. The production efficiency is seriously limited. After wet chemical treatment, the uniformity of the suede surface of the silicon wafer is poor, the size of the "pyramid" structure is large, and the anti-reflection effect is average. It is easy to be brought into the cleaning process, causing solution pollution, reducing the service life of the cleaning solution, and affecting the cleaning effect. Contents of the invention [0003] The technical problem to be solved by the present invention is to overcome the defects of the prior art, and to provide a wet chemical treatm...

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Problems solved by technology

[0002] At present, the existing wet chemical treatment methods for crystalline silicon solar cells are generally composed of silicon wafer pretreatment, polishing, texturing, RCA cleaning, drying and other processes. The production efficiency is seriously limited. After wet chemical treatment, the uniformity of the suede surface of the silicon wafer is poor, the size of the "pyramid" structure is large, and the anti-reflection effect is average. It is easy to be brought into the cleaning process, causing solution pollution, reducing the service life of the cleaning solution, and affecting the cleaning effect, etc.

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