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Preparation method of hollow silicon dioxide nanomaterial

A technology of nanomaterials and silica, which is applied in the field of preparation of hollow silica nanomaterials, can solve problems such as uneven particle size, unsuitability for large-scale production, and irregular shape of materials, and achieve easy modification of the dispersed surface, shape The effect of controllable appearance and structure, uniform dispersion

Active Publication Date: 2015-03-25
SHANGHAI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The soft template method uses surfactants, micelles or polymer vesicles as flexible templates to prepare SiO 2 hollow porous material, but the SiO prepared by this method 2 The shape of the material is irregular, the particle size is uneven and the shell is easily damaged
The organic solvent used is easy to cause environmental pollution, the yield is low, and it is not suitable for large-scale production

Method used

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  • Preparation method of hollow silicon dioxide nanomaterial
  • Preparation method of hollow silicon dioxide nanomaterial
  • Preparation method of hollow silicon dioxide nanomaterial

Examples

Experimental program
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Effect test

Embodiment 1

[0018] a. First prepare carbon spheres according to the existing known technology: Weigh 1.98 g of glucose with an electronic balance, add 20 mL of deionized water to sonicate until dissolved, and pour it into a 100 mL autoclave lined with polytetrafluoroethylene , reacted at 180 °C for 6 h, after the reaction was completed, the product was taken out from the reactor, centrifuged with ethanol and deionized water, washed, and dried at 60 °C to obtain a particle size of 180 nm Left and right carbon spheres with uniform shape;

[0019] b. Dissolve 50 mg of prepared carbon spheres in 20 mL of ethanol, then add 100 μL of 3-aminopropyltriethoxysilane (APTES), and stir at room temperature for 2 h;

[0020] c. Add 100 μL tetraethyl orthosilicate (TEOS) and 250 μL ammonia water (NH 3 ·H 2 O, 25~28 wt%), stirred at room temperature for 12 h and then centrifuged;

[0021] d. Dissolve the centrifuged product in 18 mL deionized water, add 0.0364 g cetyltrimethylammonium bromide (CTAB), ...

Embodiment 2

[0024] Example 2: The preparation process and steps of this example are basically the same as those of Example, the difference lies in step b:

[0025] 50 mg of the prepared carbon spheres were dissolved in 20 mL of ethanol without adding 3-aminopropyltriethoxysilane (APTES), and stirred at room temperature for 2 h.

[0026] The result obtained is quite different from the morphology of Example 1, a complete hollow spherical structure cannot be formed, the surface has many wrinkles, and the agglomeration is serious.

Embodiment 3

[0028] The preparation process and steps of this embodiment are basically the same as in Example 1, except that the d step:

[0029] Dissolve the centrifuged product in 18 mL deionized water, add 0.9 mL 0.001M NaOH, stir well, add 200 μL TEOS dropwise, and stir for 2 h; no cetyltrimethylammonium bromide (CTAB ).

[0030] The obtained result is quite different from the morphology of Example 1, and the product is a solid silica sphere with non-uniform particle size.

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Abstract

The invention relates to a preparation method of a hollow silicon dioxide nanomaterial. According to the preparation method, with carbon nanospheres as a hard template, tetraethoxysilane (TEOS) as a silicon source, water as a solvent and cetyl trimethyl ammonium bromide (CTAB) as a structure-directing agent, the hollow SiO2 nanomaterial which is even in appearance and folded in surface can be formed after residual organic matters such as carbon spheres and CTAB are removed by use of subsequent heat treatment. A TEM picture indicates that the SiO2 nanomaterial prepared by use of the method has a hollow structure and is about 20 nanometers in wall thickness and about 200 nanometers in grain size. The hollow SiO2 nanomaterial prepared by use of the method has potential application prospect in the fields such as biomedicine.

Description

technical field [0001] The invention relates to a preparation method of a hollow silica nanometer material. Background technique [0002] With the development of nanotechnology, nanomaterials have been widely used in many fields such as catalysis, biomedicine and fine chemical industry. Among them, nano silicon dioxide (SiO 2 ) As one of the extremely important new inorganic materials, because of its incomparable advantages such as adjustable particle size, high specific surface area, good dispersion performance, high structural stability, abundant sources, and low cost, it plays a pivotal role in many fields role. [0003] At present, materials with different nanostructures and special morphologies on nanoscale, such as nanoparticles, nanowires, nanotubes, and nanorods, have been extensively studied. Among them, hollow porous nanostructures have always been one of the hotspots of research. with conventional SiO 2 Compared with other materials, this kind of material has...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B33/12B82Y30/00B82Y40/00
Inventor 张海娇徐慧娟朱学栋李立昂应敏霞焦正
Owner SHANGHAI UNIV
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