Large-area online measurement device and method for geometrical parameters of nano-structure

Abstract

The invention discloses a large-area online measurement device and a large-area online measurement method for geometrical parameters of a nano-structure. The three-dimensional microscopic morphology of the nano-structure in a large-area region containing an entire viewing field can be obtained. Light emitting from a light source is changed into monochromatic light through a monochromator, the monochromatic light sequentially passes through a collimating mirror, a polarizer and a polarizing arm-end phase compensator to obtain an elliptical polarized beam, and then the elliptical polarized beam is projected to the surface of the to-be-measured nano-structure; a light intensity signal corresponding to zero-stage diffraction light in a reflected beam of the to-be-measured nano-structure is acquired, and a measurement imaging Muller matrix of the to-be-measured nano-structure is calculated; geometrical parameter values of the to-be-measured nano-structure at corresponding pixel points are obtained by matching extraction, and the geometrical parameter extraction values at all the pixel points form the three-dimensional microscopic morphology of the to-be-measured nano-structure. A large-area, quick, low-cost, contactless, non-destructive and accurate measurement way can be provided for one-dimensional and two-dimensional sub-wavelength periodic nano-structures involved in a pattern-transfer-based batch manufacturing method such as a photoetching process, a nano-impressing process and other processes.

Description

technical field [0001] The invention belongs to nano-manufacturing, especially the field of on-line process monitoring and optimization control in large-scale nano-manufacturing, and specifically relates to a large-area online measuring device and method for measuring nano-structure geometric parameters such as characteristic line width. , line height, side wall angle, period spacing, overlay error, and large-area online measurement of line edge roughness and line width roughness. Background technique [0002] Nano-manufacturing refers to the manufacturing technology in which the characteristic size of the product is on the order of nanometers, that is, the manufacturing technology in which the characteristic size is within 100nm. In order to achieve effective process monitoring, rapid, low-cost, non-destructive and accurate measurement of the characteristic line width (ie critical dimension), line height, side wall angle and other geometric parameters of nanostructures in n...

AI Technical Summary

Problems solved by technology

At the same time, the above-mentioned optical scattering measurement technology can only perform single-point testing. If you want to obtain the distribution information of the parameters to be measured at multiple points on the sample or in a large area, you need to move the sample stage for multiple tests or point-to-point scanning, which will seriously affect the quality of the sample. Analyzing Test Efficiency

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