Porous metal membrane produced by means of noble gas ion bombardment
A technology of porous metal and inert gas, applied in the direction of membrane, membrane technology, electrical components, etc., can solve the problems of low flow rate, complex structure, high component sensitivity, etc., and achieve the effect of high temperature resistance
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[0035] figure 1 Ion metering shown as 1.5E 15 / cm on both sides 2 Scanning electron micrographs of 5 μm thick stainless steel foil after argon ion implantation and atomization by sputtering. The inductively coupled plasma was generated at a frequency of 13.56 MHz by a water-cooled quartz antenna inside the vacuum chamber, which was previously filled with 0.5 Pa of argon. The power coupled into the antenna is 400W. The pulse voltage as plasma immersion ion implantation was set to minus 25 kV with a pulse duration of 10 μs and a frequency of 2 kHz. Inject 1.5E 15 / cm 2 ion dose. The surface temperature of the stainless steel foil is controlled by an infrared camera. The temperature was set at 580°C. Subsequently, the accelerating voltage was lowered, and the foil was sputtered at an accelerating voltage of 2 kV. The pore size, as measured and indicated by scanning electron micrographs, is from 0.4 μm to 1 μm.
[0036] figure 2 show figure 1 Scanning electron micrograph ...
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