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A fast-changing double-sided reciprocating continuous coating magnetron sputtering roll-to-roll coating machine

A magnetron sputtering and coating machine technology, which is applied in sputtering coating, ion implantation coating, vacuum evaporation coating, etc., can solve the problems of bulky coating machine structure, unfavorable coating high efficiency, limited installation quantity, etc., to achieve Simplify the electrical control device and program, facilitate the control of film layer parameters, and the effect of neat winding edge

Active Publication Date: 2017-06-09
CHANGZHOU INST OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the cathode sputtering film-forming device, the winding-type vacuum coating equipment can obviously improve the film-forming efficiency because of its continuous production. However, in the existing winding-type vacuum coating equipment, for each The number of membrane cathode chambers installed is limited, the sputtering time and sputtering atmosphere of each cathode chamber are difficult to accurately control, and the stability of film formation is poor. Most of them can only produce one or two layers of dielectric films, but cannot continuously sputter three layers of dielectric films. , because the sputtering film-forming time of the dielectric film in the middle of the three-layer dielectric film is longer, and the film-forming atmosphere is different from the atmosphere of the upper and lower dielectric films. The existing winding-type vacuum coating equipment rotates synchronously, and the single cathode chamber The time for sputtering to form a film is obviously not enough, and the atmosphere in each cathode chamber is easy to interfere with each other; in addition, the existing winding-type vacuum coating equipment often needs to be used in conjunction with a cleaning device, a heating device, and an unwinding and winding mechanism to form a production line. It will cause a lot of equipment and occupy a large production area
In addition, in some cases, it is necessary to coat both sides of the flexible substrate with a functional film. In this case, the structure of the coating machine will be more bloated, resulting in a larger equipment structure and a more complicated electrical control system.
[0005] In addition, the existing coating machine needs to replace the cathode target after a coating is completed, and the target replacement is carried out by opening the vacuum chamber, so that before continuing to coat, it is necessary to recreate the vacuum and other process conditions, which not only prolongs the processing time. cycle, and more resources such as electricity are used, which is not conducive to achieving high efficiency and low cost of coating

Method used

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  • A fast-changing double-sided reciprocating continuous coating magnetron sputtering roll-to-roll coating machine
  • A fast-changing double-sided reciprocating continuous coating magnetron sputtering roll-to-roll coating machine
  • A fast-changing double-sided reciprocating continuous coating magnetron sputtering roll-to-roll coating machine

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Embodiment

[0036] Such as figure 1 As shown, a kind of rapid target-changing double-sided reciprocating continuous coating magnetron sputtering roll-to-roll coating machine of the present embodiment comprises a vacuum chamber 1, an unwinding chamber 2 and a winding chamber 9 arranged on both sides of the vacuum chamber 1, located in The unwinding mechanism 201 in the unwinding chamber 2, the rewinding mechanism 901 arranged in the rewinding chamber 9, and the two groups of cold rolls 8 arranged in the vacuum chamber 1 also include the return conversion target device 10 and the deviation correcting device 5. A gate valve 3 is provided between the chamber 2 and the vacuum chamber 1, and between the winding chamber 9 and the vacuum chamber 1, to prevent the gas in the unwinding chamber 2 and the winding chamber 9 from entering the vacuum chamber 1, so as to avoid affecting the vacuum The vacuum degree of chamber 1; the base belt 4 between the unwinding mechanism 201 and the winding mechanis...

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Abstract

The invention discloses a quick target-exchange double-sided reciprocating continuous-coating magnetron sputtering winding coating machine, belonging to the field of coating equipment. The quick target-exchange double-sided reciprocating continuous-coating magnetron sputtering winding coating machine comprises a vacuum chamber, an unwinding mechanism, a winding mechanism, two groups of cold rolls, rotary target exchange devices and deviation rectifying devices, wherein a base band between the unwinding mechanism and the winding mechanism is reversed by a reversing roll and then wound on the two groups of cold rolls in an S-shaped, two sets of deviation rectifying devices are respectively arranged on the unwinding mechanism and the winding mechanism, and the unwinding mechanism and the winding mechanism drive the base band to realize reciprocating motion; cathode small chambers with openings on two sides are correspondingly arranged on the circumferential surface, wound with the base band, of the two groups of cold rolls, and the two groups of rotary target exchange devices are arranged correspondingly to the two groups of cathode small chambers. Cathode targets can be fast exchanged timely under the condition of not opening the coating vacuum chamber, the continuous coating of a double-sized multilayer functional membrane can be realized by utilizing the double cold rolls and the reciprocating motion of the base band, and the coating efficiency can be improved; each functional membrane on the two sides of the base band can be separately coated so as to facilitate the control of the membrane parameters.

Description

technical field [0001] The invention relates to a vacuum coating machine, more specifically, to a magnetron sputtering winding coating machine for double-sided reciprocating continuous coating with rapid target change. Background technique [0002] Vacuum roll coating technology is a technology that prepares one or more layers of thin films with certain functions on the surface of the coil substrate by thermal evaporation or magnetron sputtering in a vacuum chamber. The vacuum winding coating equipment mainly has the following characteristics: first, the substrate to be coated is a flexible substrate, that is, it can be wound; second, the coating process is continuous, that is, the coating is carried out continuously within a working cycle; Third, the coating process is carried out in a high vacuum environment. During the unwinding and rewinding process of the winding coating machine, the surface of the substrate is coated with a thin film. The structure of the coating is t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/56C23C14/35
CPCC23C14/35C23C14/562
Inventor 朱锡芳杨辉徐安成陈功许清泉
Owner CHANGZHOU INST OF TECH
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