High skin-attaching-performance crystal facial mask spunlaced non-woven fabric and processing method thereof

A non-woven fabric, high skin-adhering technology, used in non-woven fabrics, textiles and paper making, etc., can solve the problems of low toughness and skin-adhering, mask detachment from the skin, low air and moisture permeability, etc., and achieves good drape. , the skin is soothing and silky to the touch

Inactive Publication Date: 2015-07-08
SHANDONG PROVINCE WINSON NON WOVEN MATERIALS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the non-woven fabric produced in the prior art has low toughness and skin-adhesiveness in a wet state. Once there is a facial movement, the mask will be separated from the skin and foam. At the same time, the permeability is poor, and the breathability and moisture permeability are low, resulting in skin discomfort. , In addition, white and other color mask materials are attached to the face, and the sudden appearance can easily frighten people

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] In order to better understand the present invention, the embodiments of the present invention are explained in detail below.

[0025] A spunlace nonwoven fabric with high skin-adherence crystal mask, using cupro ammonia fiber and silk as raw materials, the cupro ammonia fiber and silk are pre-mixed by a cotton mixer at a mass ratio of 9:1, and intertwined with each other to form a non-woven fabric. spinning.

[0026] The surface of the non-woven fabric is provided with mesh holes.

[0027] The non-woven fabric is a spunlaced fabric with a grammage of 30±2g / ㎡ and a uniform net.

[0028] After the mesh is strengthened and entangled by double spunlace on the front and back, a 40-45 mesh mesh is used on the platform, and the mesh is punched with a high-pressure water needle.

[0029] Remove silkworm chrysalis and silkworm shells during pre-mixing in the cotton mixer.

[0030] The length of the cupro ammonia fiber is 30-45mm and the fineness is 1.2D, the length of the sil...

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Abstract

The invention discloses high skin-attaching-performance crystal facial mask spunlaced non-woven fabric and a processing method thereof. Copper ammonia fibers and silk serve as raw materials, and the non-woven fabric is formed by pre-mixing and entangling the copper ammonia fibers and the silk in a disorder mode through a cotton mixing machine according to the mass ratio of 9:1. The method includes the following steps that firstly, the copper ammonia fibers and the silk are weighed according to the mass ratio of 9:1; secondly, the copper ammonia fibers and the silk are mixed; thirdly, the mixed raw materials are opened, carded, lapped in a crossed mode and drafted to form an even net face; fourthly, pre-wetting is adopted, strengthening is conducted on platform spunlace, and the non-woven fabric is formed through punching; fifthly, the non-woven fabric enters a drying machine after being dehydrated, and winding, splitting and packaging are conducted. The manufactured spunlaced non-woven fabric product is soft, smooth and silky in touch and has the features of tenacity and fresh, a cross lapping spunlace technology is adopted so that the lengthwise and transverse strength ratio of the manufactured product reaches 1.3:1, deformation is avoided, softness and the high attachment degree are achieved, normal movement is achieved, displacement is avoided, and therefore the manufactured product has the advantages that lightness, thinness and transparency are achieved, and a crystal is invisible.

Description

technical field [0001] The invention relates to the technical field of nonwoven fabrics, in particular to a highly skin-adhesive spunlace nonwoven fabric used as a base material of facial mask products and a processing method thereof. Background technique [0002] In the prior art, non-woven fabrics are often used as the base material for facial masks, cleansing paper, and wet wipes. Non-woven fabrics are required to have high hygroscopicity and toughness in wet conditions. In addition, for high-end facial mask products, non-woven fabrics are also required. It has considerable permeability and skin fit, and also has certain effects such as crystal transparency and invisibility. However, the non-woven fabric produced in the prior art has low toughness and skin-adhesiveness in a wet state. Once there is a facial movement, the mask will be separated from the skin and foam. At the same time, the permeability is poor, and the breathability and moisture permeability are low, resul...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): D04H1/4258D04H1/4266D04H1/492
Inventor 史成玉夏伦全刘双营李军华王远富徐艳峰商延航翟淑霞王静
Owner SHANDONG PROVINCE WINSON NON WOVEN MATERIALS
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