Method for preparing continuous surface-shape spiral phase plate

A technology of spiral phase plate and surface shape, which can be applied in opto-mechanical equipment, photo-engraving process of patterned surface, and originals for opto-mechanical processing, etc. It can solve the problems of low production efficiency, high production cost and many production processes. , to achieve the effect of high preparation efficiency, strong versatility and wide application

Inactive Publication Date: 2015-08-26
INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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Problems solved by technology

Electron beam direct writing and focused ion beam direct writing are methods for preparing helical phase plate structures, but this method requires expensive equipment, and because it uses point-by-point direct writing, the preparation efficiency is very low and it is difficult to meet Practical requirements
At present, there is another processing technology that uses a step-like structure to approximate this continuous surface str

Method used

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  • Method for preparing continuous surface-shape spiral phase plate
  • Method for preparing continuous surface-shape spiral phase plate
  • Method for preparing continuous surface-shape spiral phase plate

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Embodiment Construction

[0019] The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments. But the following examples are limited to explain the present invention, and the protection scope of the present invention should include the entire content of the claims, and through the following examples, those skilled in the art can realize the entire contents of the claims of the present invention.

[0020] A method for preparing a continuous surface spiral phase plate in a specific embodiment is shown in the figure. figure 1 is the surface shape of the target structure to be prepared, it can be seen that the spiral phase plate is a structure whose sagittal height changes with the angle, its aperture D is 1 inch, the wavelength used is 532nm, and the corresponding phase modulation range is 0-2π, that is The corresponding saggy height h is 1.154 μm. Then it can be calculated At the same time, 10×h=11.54 μm. According to the selection cr...

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Abstract

The invention discloses a method for preparing a continuous surface-shape spiral phase plate, and relates to the field of micro machining, spinning optics and the like. In order to overcome the defects of low preparation efficiency, high cost and the like during preparation of the spiral phase plate in the prior art, the invention provides a novel method for preparing the continuous surface-shape spiral phase plate. According to the method, quantitative combination is performed on a target surface phase to form a mask structure, and the mask structure is utilized to realize modulating quantity of illumination, so that the preparation of the continuous surface-shape spiral phase plate can be realized by utilizing single-time exposure, and the method is a novel method which is low in cost, high in efficiency, practical and relatively large in application prospect.

Description

technical field [0001] The invention relates to the technical field of micromachining, in particular to a method for preparing a continuous surface spiral phase plate. Background technique [0002] Spiral phase plate is a device with special optical properties. Its optical thickness gradually increases with the rotation angle. When light is incident on the spiral phase plate, parallel light will be transformed into vortex light carrying angular momentum. This vortex light is used in optical tweezers, ion manipulation, quantum communication There are good applications in other fields. Therefore, there is an urgent requirement for its preparation technology. Electron beam direct writing and focused ion beam direct writing are methods for preparing helical phase plate structures, but this method requires expensive equipment, and because it uses point-by-point direct writing, the preparation efficiency is very low and it is difficult to meet practical requirements. At presen...

Claims

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Application Information

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IPC IPC(8): G03F1/50G03F7/22G02F1/01
CPCG03F1/50G02B5/3083G03F7/22
Inventor 史立芳曹阿秀郭书基邓启凌张满庞辉王佳舟
Owner INST OF OPTICS & ELECTRONICS - CHINESE ACAD OF SCI
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