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A kind of cu-ti amorphous alloy thin film and preparation method thereof

The technology of amorphous alloy thin film and cu-ti is applied in the field of amorphous alloy thin film material, which can solve the problems of long preparation time, complicated operation process and high cost, and achieve the effect of reducing production cost and simplifying preparation process.

Active Publication Date: 2017-11-28
HEFEI UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, in the process of preparing amorphous thin films: 1) magnetron sputtering method, the bonding force between the prepared film and the substrate is stronger, but because the magnetron sputtering method needs to bombard the target with argon ions, the prepared samples are prone to contain impurity, and the target needs to be prepared, the operation process is complicated, and the cost is high; 2) The solid-phase amorphization reaction method needs to explore the appropriate value of reaction time, reaction temperature, and single-layer film thickness, the process is cumbersome, and the preparation time is long ; 3) When the double electron beam evaporation method is used, the substrate will have a higher temperature due to the influence of the thermal radiation of the two electron beam evaporation sources, and a substrate cooling device is generally used

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  • A kind of cu-ti amorphous alloy thin film and preparation method thereof
  • A kind of cu-ti amorphous alloy thin film and preparation method thereof
  • A kind of cu-ti amorphous alloy thin film and preparation method thereof

Examples

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Comparison scheme
Effect test

Embodiment 1

[0024] Example 1: Cu 82 Ti 18 Preparation of Alloy Thin Films

[0025] Step 1: Grind the raw materials Ti (99.9wt%) and Cu (99.9wt%) to remove the surface scale, and after ultrasonic cleaning with acetone and alcohol for 10 minutes, place them in a copper crucible and a tungsten boat respectively, and place the substrate glass After ultrasonically cleaning silicon wafers with acetone, alcohol, and deionized water for 10 minutes, dry them and place them on the substrate tray;

[0026] Step 2: Close the intake valve, turn on the cooling water, put the exhaust pipe out of the window, turn on the main power supply of the coating equipment, turn on the power supply of the mechanical pump, open the side pumping valve, turn on the vacuum gauge, and when the vacuum degree is less than 10Pa, turn off the side pumping valve, open the solenoid valve, open the gate valve, and turn on the power supply of the molecular pump. When the vacuum degree is lower than 1×10 -4 At Pa, turn on the...

Embodiment 2

[0029] Example 2: Cu 66 Ti 34 Preparation of Amorphous Alloy Thin Films

[0030] Step 1: Grind the raw materials Ti (99.9wt%) and Cu (99.9wt%) to remove the surface scale, and after ultrasonic cleaning with acetone and alcohol for 10 minutes, place them in a copper crucible and a tungsten boat respectively, and place the substrate glass After ultrasonically cleaning silicon wafers with acetone, alcohol, and deionized water for 10 minutes, dry them and place them on the substrate tray;

[0031] Step 2: Close the intake valve, turn on the cooling water, put the exhaust pipe out of the window, turn on the main power supply of the coating equipment, turn on the power supply of the mechanical pump, open the side pumping valve, turn on the vacuum gauge, and when the vacuum degree is less than 10Pa, turn off the side pumping valve, open the solenoid valve, open the gate valve, and turn on the power supply of the molecular pump. When the vacuum degree is lower than 1×10 -4 At Pa, t...

Embodiment 3

[0036] Example 3: Cu 60 Ti 40 Preparation of Amorphous Alloy Thin Films

[0037] Step 1: Grind the raw materials Ti (99.9wt%) and Cu (99.9wt%) to remove the surface scale, and after ultrasonic cleaning with acetone and alcohol for 10 minutes, place them in a copper crucible and a tungsten boat respectively, and place the substrate glass After ultrasonically cleaning silicon wafers with acetone, alcohol, and deionized water for 10 minutes, dry them and place them on the substrate tray;

[0038] Step 2: Close the intake valve, turn on the cooling water, put the exhaust pipe out of the window, turn on the main power supply of the coating equipment, turn on the power supply of the mechanical pump, open the side pumping valve, turn on the vacuum gauge, and when the vacuum degree is less than 10Pa, turn off the side pumping valve, open the solenoid valve, open the gate valve, and turn on the power supply of the molecular pump. When the vacuum degree is lower than 1×10 -4At Pa, tu...

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Abstract

The invention discloses a Cu-Ti amorphous alloy thin film and a preparation method thereof, characterized in that: the structural formula of the amorphous alloy thin film is CuxTi100-x (54≤x≤66), wherein x is the atomic percentage of Cu element; and The difference in the usual preparation process is that the amorphous alloy thin film is deposited by electron beam + resistance evaporation composite coating technology. In the preparation process, metal Ti and metal Cu are evaporated by electron beam and resistance evaporation source respectively, and the substrate substrate does not need Adding a cooling device simplifies the preparation process and reduces the production cost. The amorphous film prepared by the invention has obvious amorphous structure, and the composition and size of the amorphous film can be controlled by adjusting the vapor deposition current and vapor deposition time.

Description

technical field [0001] The invention belongs to the technical field of amorphous alloy thin film materials, and in particular relates to a Cu-Ti amorphous alloy thin film and a preparation method thereof. Background technique [0002] Amorphous alloy is a new type of metal material developed in the 1960s. Compared with ordinary crystalline alloys, it is favored because of its superior mechanical properties, magnetic properties, corrosion resistance and biocompatibility. It has attracted extensive attention in the field of materials and is considered to have extremely wide application potential. [0003] Amorphous alloy thin films not only have the excellent characteristics of bulk amorphous alloys, but also have lower requirements for preparation and a wider range of glass-forming capabilities because of their characteristics similar to two-dimensional materials. In addition, amorphous alloy thin films have excellent uniformity, wear and corrosion resistance, high hardness,...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/30C23C14/26C23C14/14C22C45/00
Inventor 张博朱振西杨宇
Owner HEFEI UNIV OF TECH