Graphene preparation method and graphene prepared through graphene preparation method

A technology of graphene and graphene suspension, which is applied in the field of graphene and can solve the problems of low yield of single-layer graphene

Inactive Publication Date: 2015-11-25
HUAWEI TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The yield of monolayer graphene prepared by this method is relatively low

Method used

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  • Graphene preparation method and graphene prepared through graphene preparation method
  • Graphene preparation method and graphene prepared through graphene preparation method
  • Graphene preparation method and graphene prepared through graphene preparation method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0078] Weigh 0.2 g of 200-mesh graphite powder and place it in a 50 ml reactor, add 3 ml of chlorosulfonic acid to mix, put the mixture in a polytetrafluoroethylene reactor at 120° C. and heat for 5 hours to obtain pretreated graphite. Subsequently, the pretreated graphite is taken out and 15ml of concentrated sulfuric acid is added, and 6ml of hydrogen peroxide solution is added dropwise under stirring conditions to make the pretreated graphite gradually expand, and the pretreated expanded graphite is obtained after 1 hour of reaction, which is added to the pretreated expanded graphite. Water is added to separate the pretreated expanded graphite from the solution, and the obtained expanded graphite product is filtered, washed with water, and dried to obtain the expanded graphite. Take 50 mg of the expanded graphite, mix it with potassium chlorate in a ratio of 1:3, and add 12 ml of a mixed solution of concentrated sulfuric acid and nitric acid (the ratio of concentrated sulfur...

Embodiment 2

[0080] Weigh 0.2 g of 325-mesh graphite powder and place it in a 50 ml reactor, add 3 ml of chlorosulfonic acid for mixing, put the mixture in a polytetrafluoroethylene reactor at 120° C. and heat for 5 hours to obtain pretreated graphite. Subsequently, the pretreated graphite was taken out and 15ml of concentrated sulfuric acid was added, and 6ml of hydrogen peroxide solution was added dropwise under agitation to gradually expand the pretreated graphite, and the pretreated expanded graphite was obtained after 10 minutes of reaction. Water is added to separate the pretreated expanded graphite from the solution, and the obtained expanded graphite product is filtered, washed with water, and dried to obtain the expanded graphite. Take 50 mg of the expanded graphite, mix it with potassium chlorate in a ratio of 1:3, and add 12 ml of a mixture of concentrated sulfuric acid and nitric acid (the ratio of concentrated sulfuric acid and nitric acid in the mixture is 3:1), mix and place ...

Embodiment 3

[0082] Weigh 0.2 g of 325-mesh graphite powder and place it in a 50 ml reactor, add 6 ml of chlorosulfonic acid to mix, put the mixture in a polytetrafluoroethylene reactor at 120° C. and heat for 5 hours to obtain pretreated graphite. Subsequently, the pretreated graphite was taken out and 15ml of concentrated sulfuric acid was added, and 10ml of hydrogen peroxide solution was added dropwise under agitation to gradually expand the pretreated graphite, and the pretreated expanded graphite was obtained after 5 hours of reaction. Water is added to separate the pretreated expanded graphite from the solution, and the obtained expanded graphite product is filtered, washed with water, and dried to obtain the expanded graphite. Take 50 mg of the expanded graphite, mix it with potassium chlorate in a ratio of 1:2, and add 12 ml of a mixture of concentrated sulfuric acid and nitric acid (the ratio of concentrated sulfuric acid and nitric acid in the mixture is 3:1), mix and place to rea...

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Abstract

Embodiments of the present invention provide a graphene preparation method and graphene prepared through the graphene preparation method. The graphene preparation method comprises: (1) preparing expanded graphite; (b) mixing the expanded graphite obtained in the step (a) and an oxidizing agent, and initiating a weak oxidation reaction to obtain expanded graphite oxide; and (c) peeling the expanded graphite oxide obtained in the step (b) in a peeling reagent to obtain a graphene suspension. According to the embodiments of the present invention, the surface layer portion of the expanded graphite is oxidized with the oxidizing agent to obtain the expanded graphite oxide, and then the expanded graphite oxide is placed into the peeling reagent to be peeled so as to obtain the graphene suspension; and with the method, the surface layer portion of the expanded graphite is oxidized with the oxidizing agent to open the edge of the expanded graphite, such that the peeling reagent easily enters the internal of the expanded graphite so as to completely peel and improve the yield of the single-layer graphene.

Description

technical field [0001] The invention relates to the technical field of preparing graphene products, more specifically, the invention relates to a method for preparing graphene by a solvent stripping method and graphene prepared by the method. Background technique [0002] Graphene is a two-dimensional graphite material with a single molecular layer. Because of its potential high electrical conductivity, high thermal conductivity, high strength and special quantum properties, it is considered to be a new material to replace silicon in the future. At present, the methods for preparing graphene include: mechanical exfoliation, solvent exfoliation, chemical vapor deposition (Chemical Vapor Deposition, CVD), chemical oxidation-reduction, electrochemical exfoliation, etc., in order to make the obtained graphene retain better conductivity characteristics, it is necessary to minimize the structural defects of graphene sheets. The mechanical exfoliation method can retain the structu...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C01B31/04
Inventor 闫立峰夏圣安谢封超
Owner HUAWEI TECH CO LTD
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