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Surface active agent and developing solution used for color filter negative photoresist

A surfactant and developer technology, applied in the field of compounds and developers, can solve the problems affecting the development uniformity, the partial erosion of the defoamer pattern, the difference in pattern thickness, etc., and achieve good development fineness, accurate size, and no production Distortion effect

Inactive Publication Date: 2015-11-25
FUJIFILM ELECTRONICS MATERIALS SUZHOU
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the development process, once the foam adheres to the surface of the photoresist, it will affect the uniformity of development and cause thickness differences on the upper surface of the pattern
Although adding a defoamer can reduce the degree of foam generation, the defoamer will also cause erosion to the graphic part

Method used

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  • Surface active agent and developing solution used for color filter negative photoresist
  • Surface active agent and developing solution used for color filter negative photoresist
  • Surface active agent and developing solution used for color filter negative photoresist

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Provide a kind of surfactant, described surfactant is block type polyether nonionic surfactant, is to have the polyoxyethylene-polyoxypropylene block polymer of structure shown in general formula:

[0028] .

[0029] where R 1 , R 2 Each independently represents a C1-C18 aliphatic or aromatic hydrocarbon group, preferably a C6-C15 aliphatic or aromatic hydrocarbon group. x is an integer of 0-5, preferably an integer of 1-4. EO is a polyoxyethylene chain segment, PO is a polyoxypropylene chain segment, the bonding position of the polyoxyethylene chain segment and the polyoxypropylene chain segment in the general formula can be determined arbitrarily, and the preferred bonding position is the polyoxypropylene chain segment Located at the end of the polyether, the polyether is an EO segment or a PO segment, and the end is far away from R 1one end. m represents an integer of 0-20, n represents an integer of 0-10, the values ​​of m and n are different from 0 at the sa...

Embodiment 2

[0036] The AEO-9 in Example 1 was replaced with OP-10, and the feeding ratio and reaction method were unchanged to obtain the block polyether surfactant S2. Wherein OP-10 is an alkylphenol polyoxyethylene ether nonionic surfactant from Ham Company.

Embodiment 3

[0038] The AEO-9 in Example 1 was replaced with OP-13, and the feeding ratio and reaction method were unchanged to obtain the block polyether surfactant S3. Wherein OP-13 is an alkylphenol polyoxyethylene ether nonionic surfactant from Ham Company.

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Abstract

The invention discloses a surface active agent and a developing solution used for color filter negative photoresist. The surface active agent is block type polyether non-ionic surface active agent, and is polyoxyethylene-polyoxypropylene block polymer, wherein EO is polyoxyethylene chain segment and PO is polyoxypropylene chain segment; and the developing solution comprises strong base, the block type polyether non-ionic surface active agent and purified water. Through the above mode, the developing solution is good in developing fineness on non-graphical parts, and the developed graphics have the advantages of completeness and accurate dimension without residue, broken lines, lateral erosion, deformation and the like.

Description

technical field [0001] The invention relates to a compound and a developing solution, in particular to a surfactant and a developing solution for negative photoresists of color filters. Background technique [0002] With the rapid development of display technology, flat panel displays have very obvious advantages compared with traditional video image displays due to their completely different display principles and manufacturing technologies. The flat panel display has the characteristics of complete planarization, lightness, thinness, and power saving, which is in line with the inevitable trend of future image display development. At present, the main flat-panel displays include: PDP (Plasmadisplaypanel), LCD (Liquidcrystaldisplays), FED (Fieldmissiondisplays), OLED (Organiclight-emittingdiodedisplays) and projection display technology (CRT, LCD, LCOS, DLP). [0003] LCD device is a display device with the fastest development, the most mature technology and the widest appl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/32G03F7/038
Inventor 江磊金旭
Owner FUJIFILM ELECTRONICS MATERIALS SUZHOU
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