An immersion liquid control device for immersion photolithography machine

Abstract

The invention discloses an immersion liquid control device for an immersion photolithography machine. Including the base of the immersion unit and the recovery mesh plate, the middle of the base is a circular thin liner, surrounded by a ring-shaped square structure, the center of the circular thin liner has a rectangular through hole, and the ring-shaped square body is equipped with a symmetrical horizontal liquid injection chamber and the horizontal liquid injection port, the annular square body is provided with a symmetrical horizontal liquid return cavity and a horizontal liquid return port, and the side walls of the immersion unit substrate on both sides of the horizontal liquid injection port and the horizontal liquid return port are respectively provided with gas injection ports and vertical At the recovery port, the lower surface of the annular square body of the immersion unit base is sequentially provided with a uniform immersion liquid buffer tank, a vertical recovery tank and a gas injection tank. The invention can effectively improve the utilization rate of the immersion liquid and enhance the stability of the core flow field area, can effectively increase the scanning speed of the silicon chip, improve the vertical recovery efficiency of the immersion unit and reduce the vibration of the flow field, and realize the immersion liquid The stable update and dynamic sealing control function.

Description

technical field [0001] The invention relates to a flow field dynamic sealing device, in particular to an immersion liquid control device for an immersion photolithography machine. Background technique [0002] The lithography machine is one of the core equipment for manufacturing VLSI. The modern lithography machine is mainly based on optical lithography. It uses the optical system to accurately project and expose the pattern on the mask to the silicon coated with photoresist. a. It includes a laser light source, an optical system, a projection mask composed of chip patterns, an alignment system and a silicon wafer coated with photosensitive photoresist. [0003] Immersion Lithography (Immersion Lithography) equipment fills a liquid with a high refractive index between the last projection objective lens and the silicon wafer, which improves the numerical aperture of the projection objective lens ( NA), thereby improving the resolution and depth of focus of the lithography ...

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problem of sealing the slit flow field in partial immersion lithography technology, the object of the present invention is to provide an immersion liquid control device for immersion lithography machine, which uses an air-tight structure at the edge of the flow field to prevent the slit flow field from liquid leakage, while using the method of vertical negative pressure recovery to restrain the immersion liquid

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