High-purity coating type polycrystalline silicon crucible and brushing method of coating of high-purity coating type polycrystalline silicon crucible
A polysilicon and crucible technology, which is applied in the field of solar cell production equipment, can solve the problems that the silicon nitride layer is difficult to achieve a high degree of density and cannot meet production requirements, and can prevent sintering shrinkage, high isolation, and prevent participation in the reaction. Effect
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Embodiment 1
[0042] as attached figure 1 As shown: the present invention is a high-purity coated polysilicon crucible, including a crucible body 1, a plurality of pits 2 are evenly distributed on the surface of the crucible 1, and a plurality of pits 2 are evenly distributed on the surface of the crucible 1. The surface is sequentially attached with a first nitride layer 3, a second oxide layer 4 and a third nitride layer 5;
[0043] The first nitride layer 3 is coated with milky silicon nitride on the surface of the crucible 1 uniformly distributed with several pits 2 by brushing, and the coating of the first nitride layer 3 The thickness range is 2mm;
[0044] The second oxide layer 4 is powdery silicon oxide, and the powdery silicon oxide is sprayed on the surface of the first nitrided layer 3 that has not been condensed by spraying, and the second oxide layer 4 is formed on the first surface of the first nitride layer 3. The surface of the nitride layer 3 is granular;
[0045] The t...
Embodiment 2
[0066] as attached figure 1 As shown: the present invention is a high-purity coated polysilicon crucible, including a crucible body 1, a plurality of pits 2 are evenly distributed on the surface of the crucible 1, and a plurality of pits 2 are evenly distributed on the surface of the crucible 1. The surface is sequentially attached with a first nitride layer 3, a second oxide layer 4 and a third nitride layer 5;
[0067] The first nitride layer 3 is coated with milky silicon nitride on the surface of the crucible 1 uniformly distributed with several pits 2 by brushing, and the coating of the first nitride layer 3 The thickness range is 6mm;
[0068] The second oxide layer 4 is powdery silicon oxide, and the powdery silicon oxide is sprayed on the surface of the first nitrided layer 3 that has not been condensed by spraying, and the second oxide layer 4 is formed on the first surface of the first nitride layer 3. The surface of the nitride layer 3 is granular;
[0069] The t...
Embodiment 3
[0090] as attached figure 1 As shown: the present invention is a high-purity coated polysilicon crucible, including a crucible body 1, a plurality of pits 2 are evenly distributed on the surface of the crucible 1, and a plurality of pits 2 are evenly distributed on the surface of the crucible 1. The surface is sequentially attached with a first nitride layer 3, a second oxide layer 4 and a third nitride layer 5;
[0091] The first nitride layer 3 is coated with milky silicon nitride on the surface of the crucible 1 uniformly distributed with several pits 2 by brushing, and the coating of the first nitride layer 3 The thickness range is 10mm;
[0092] The second oxide layer 4 is powdery silicon oxide, and the powdery silicon oxide is sprayed on the surface of the first nitrided layer that has not yet condensed in a slurry form by spraying, and the second oxide layer 4 is in the first nitrogen The surface of the layer 3 is granular;
[0093] The third nitride layer 5 is atomi...
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