Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A kind of high-purity coated polysilicon crucible and its coating method

A polysilicon and crucible technology, which is applied in the field of solar cell production equipment, can solve the problems that the production requirements cannot be met, and it is difficult for the silicon nitride layer to achieve a high density level, and achieves the advantages of preventing sintering shrinkage, high isolation, and low preparation cost. Effect

Inactive Publication Date: 2016-09-28
WUXI SHUNYANG NEW ENERGY
View PDF9 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, dense silicon nitride materials must be sintered in the liquid phase under nitrogen protection atmosphere and high temperature environment, and usually the size of dense silicon nitride materials after sintering shrinks by more than 10% compared with that before sintering, so the silicon nitride layer coated on the surface of the quartz crucible It is difficult to achieve high density and cannot meet production requirements

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A kind of high-purity coated polysilicon crucible and its coating method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] as attached figure 1 As shown: the present invention is a high-purity coated polysilicon crucible, including a crucible body 1, on the surface of the crucible body 1, several pits 2 are evenly distributed, and on the surface of the crucible body 1, there are several pits 2 The surface is sequentially attached with a first nitride layer 3, a second oxide layer 4 and a third nitride layer 5;

[0043] The first nitride layer 3 is coated with milky silicon nitride on the surface of the crucible body 1 uniformly distributed with several pits 2 by brushing, and the coating of the first nitride layer 3 The thickness range is 2 mm;

[0044] The second oxide layer 4 is powdery silicon oxide, and the powdery silicon oxide is sprayed on the surface of the first nitrided layer 3 that has not been condensed by spraying, and the second oxide layer 4 is formed on the first surface of the first nitride layer 3. The surface of the nitride layer 3 is granular;

[0045] The third nitri...

Embodiment 2

[0066] as attached figure 1 As shown: the present invention is a high-purity coated polysilicon crucible, including a crucible body 1, on the surface of the crucible body 1, several pits 2 are evenly distributed, and on the surface of the crucible body 1, there are several pits 2 The surface is sequentially attached with a first nitride layer 3, a second oxide layer 4 and a third nitride layer 5;

[0067] The first nitride layer 3 is coated with milky silicon nitride on the surface of the crucible body 1 uniformly distributed with several pits 2 by brushing, and the coating of the first nitride layer 3 The thickness range is 6mm;

[0068] The second oxide layer 4 is powdery silicon oxide, and the powdery silicon oxide is sprayed on the surface of the first nitrided layer 3 that has not been condensed by spraying, and the second oxide layer 4 is formed on the first surface of the first nitride layer 3. The surface of the nitride layer 3 is granular;

[0069] The third nitrid...

Embodiment 3

[0090] as attached figure 1 As shown: the present invention is a high-purity coated polysilicon crucible, including a crucible body 1, on the surface of the crucible body 1, several pits 2 are evenly distributed, and on the surface of the crucible body 1, there are several pits 2 The surface is sequentially attached with a first nitride layer 3, a second oxide layer 4 and a third nitride layer 5;

[0091] The first nitride layer 3 is coated with milky silicon nitride on the surface of the crucible body 1 uniformly distributed with several pits 2 by brushing, and the coating of the first nitride layer 3 The thickness range is 10 mm;

[0092] The second oxide layer 4 is powdery silicon oxide, and the powdery silicon oxide is sprayed on the surface of the first nitrided layer that has not yet condensed in a slurry form by spraying, and the second oxide layer 4 is in the first nitrogen The surface of the layer 3 is granular;

[0093] The third nitride layer 5 is atomized silico...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
lengthaaaaaaaaaa
widthaaaaaaaaaa
Login to View More

Abstract

The invention relates to a high-purity coating type polycrystalline silicon crucible and a brushing method of a coating of the high-purity coating type polycrystalline silicon crucible. The high-purity coating type polycrystalline silicon crucible comprises a crucible body, wherein a plurality of pit or annular grooves are uniformly formed in the surface of the crucible body, and the surface of the crucible body is sequentially adhered with a first nitration layer, a second oxidization layer and a third nitration layer; the surface of the crucible body is brushed with the whey-state first nitration layer, powdery silicon oxide of the second oxidization layer is ejected to the surface of whey, vaporous silicon nitride is sprayed to the surface of the second oxidization layer until particles of the second oxidization layer are covered, and a smooth surface is formed on the third nitration layer. The high-purity coating type polycrystalline silicon crucible and the brushing method have the characteristics that the coating is strong in covering capacity and high in stability and isolation degree, and the crucible body is prevented from reacting during the preparation of polycrystalline silicon.

Description

technical field [0001] The invention relates to the technical field of solar cell production equipment, in particular to a high-purity coated polysilicon crucible and a coating method thereof. Background technique [0002] As we all know, the power supply in the world is becoming increasingly tense, and the application of photovoltaic technology can effectively alleviate this situation. Photovoltaic power generation mainly includes single crystal and polycrystalline cell technology. Compared with single crystal, polycrystalline photovoltaic has the advantages of low energy consumption and high efficiency; 6 to 7 times of that, so polycrystalline has been widely used in recent years. [0003] In recent years, with the increasing maturity of solar power generation technology, solar cells have been widely used in many fields such as industry, agriculture and aerospace. At present, according to the different materials used, solar cells can be divided into: silicon solar cells,...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): C30B28/06C30B29/06
Inventor 钟伟陆文研
Owner WUXI SHUNYANG NEW ENERGY
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products