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Preparation method of octaphenol hydroxyl clathrate oligomeric silsesquioxane hybrid phenolic resin

A technology of polysilsesquioxane and octaphenol hydroxyl cage, which is applied in the field of ablation heat-resistant resin-based composite materials, can solve the problems of increasing resin thermal and mechanical properties, POSS agglomeration, affecting performance, etc., to increase thermal performance and tensile properties, improved oxidation resistance, and improved intrinsic properties

Active Publication Date: 2017-08-29
AEROSPACE RES INST OF MATERIAL & PROCESSING TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The oxidation resistance and mechanical modulus of the phenolic resin physically doped with POSS are increased, especially the increase of its modulus is the most significant, and the tensile properties of the material are basically unchanged, because POSS has a similar polymer chain segment The nanometer size, so it can control the chain segment movement of the polymer, maintain its mechanical properties, and greatly increase the thermal and mechanical properties of the resin. However, the phenolic resin physically doped by POSS is prone to agglomeration, which affects its performance.
Based on the above objectives, the development of a new type of POSS hybrid phenolic resin grafted with phenolic hydroxyl groups to solve the problem that physical doping will cause POSS to a large extent to be agglomerated has become an urgent problem to be solved.

Method used

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  • Preparation method of octaphenol hydroxyl clathrate oligomeric silsesquioxane hybrid phenolic resin
  • Preparation method of octaphenol hydroxyl clathrate oligomeric silsesquioxane hybrid phenolic resin
  • Preparation method of octaphenol hydroxyl clathrate oligomeric silsesquioxane hybrid phenolic resin

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preparation example Construction

[0043] The preparation method of octaphenol hydroxyl clathrate oligomeric silsesquioxane hybrid thermosetting phenolic resin of the present invention comprises the following steps:

[0044] (1) Dissolve 100-200 parts of phenol in 85-175 parts of formaldehyde solution according to the ratio of parts by mass, add 1-50 parts of octaphenolic hydroxyl clathrate oligomeric silsesquioxane as a reactant, and heat at 40-50°C Stir in a water bath for 10 to 30 minutes, then add 0.2 to 3 parts of barium hydroxide octahydrate to adjust the pH of the solution to 8 to 9, slowly raise the temperature to 60 to 70°C, and perform a constant temperature reaction for 1 to 3 hours; the heating rate is 0.16 to 0.33°C / min;

[0045] (2) Slowly raise the temperature of the solution obtained in step (1) from 60 to 70°C to 85 to 98°C, carry out a constant temperature reaction for 1 to 3 hours, and the heating rate is 0.16 to 0.33°C / min;

[0046] (3), add 0.3~3.5 parts of phosphoric acid solution, adjus...

Embodiment 1

[0068] According to parts by mass, dissolve 130 parts of phenol in 140 parts of formaldehyde solution, add 20 parts of octaphenolic hydroxyl clathrate oligomeric silsesquioxane, stir in a water bath at 40°C for 30 minutes, and then add 1.4 parts of barium hydroxide octahydrate to adjust the solution The pH value of the mixture is 8-9, and the temperature is slowly raised to 60° C., and the constant temperature reaction is carried out for 3 hours; the heating rate is 0.25° C. / min; the mass concentration of the formaldehyde solution is 37%.

[0069] Slowly raise the temperature of the above solution from 60°C to 95°C, carry out constant temperature reaction for 1 hour, and the heating rate is 0.25°C / min;

[0070] Add 1.6 parts of phosphoric acid solution, adjust the pH value of the above solution to 5-6, stir for 15 minutes, and dehydrate in a water bath at 95°C under vacuum for 1 hour, let stand, precipitate, filter, cool to room temperature, and take out the upper layer of pure...

Embodiment 2

[0080] According to parts by mass, dissolve 100 parts of phenol in 85 parts of formaldehyde solution, add 1 part of octaphenolic hydroxyl clathrate oligomeric silsesquioxane, stir in a water bath at 40°C for 30 minutes, and then add 0.2 parts of barium hydroxide octahydrate to adjust the solution The pH value of the mixture is 8-9, and the temperature is slowly raised to 60° C., and the constant temperature reaction is carried out for 1-3 hours; the heating rate is 0.16° C. / min; the mass concentration of the formaldehyde solution is 35%.

[0081] Slowly raise the temperature of the above solution from 60°C to 95°C, carry out constant temperature reaction for 1 hour, and the heating rate is 0.16°C / min;

[0082] Add 0.3 parts of phosphoric acid solution, adjust the pH value of the above solution to 5-6, stir for 15 minutes, and dehydrate in a water bath at 95°C under vacuum for 3 hours, let stand, precipitate, filter, cool to room temperature, and take out the upper layer of pure...

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Abstract

The invention relates to cage-shaped oligomerization silsesquioxane hybridized phenolic resin with eight phenolic hydroxyl groups and a preparation method thereof. The phenolic resin is prepared by taking, by mass, 100-200 parts of phenol, 85-175 parts of formaldehyde solutions and 1-50 parts of cage-shaped oligomerization silsesquioxane as the reactants and taking, by mass, 0.2-3 parts of barium hydroxide octahydrate and 0.3-3.5 parts of phosphoric acid solutions as conditioning agents to adjust the PH value of the reactants. By means of the cage-shaped oligomerization silsesquioxane hybridized phenolic resin with the eight phenolic hydroxyl groups and the preparation method thereof, the dispersity problem of physical doped POSS in the phenolic resin is solved, the phenolic resin material which is better in dispersity and evener is obtained, and the oxidation resistance, the thermal property and the mechanical property are improved.

Description

technical field [0001] The invention relates to an octaphenol hydroxyl polyhedral clathrate silsesquioxane (OP-POSS) hybrid phenol-formaldehyde phenolic resin and a preparation method thereof, which are used for ablating heat-resistant resin-based composite materials. Background technique [0002] In the face of the increasingly stringent demand for ablation and heat-resistant composite materials in the aerospace and military fields, higher requirements are put forward for the oxidation resistance, ablation resistance, and mechanical properties of the phenolic resin matrix. In recent years, the structural modification of phenolic resins become a research hotspot in this field. Since the U.S. Air Force Laboratory used polyhedral oligomeric silsesquioxane (POSS) in the preparation of high-temperature aerospace materials in the 1990s, the related research on POSS and its grafted modified polymer doped with phenolic resin has been extensively studied. s concern. [0003] It ca...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08G8/28C08G8/10
Inventor 胡宏林冯志海余瑞莲师建军王伟
Owner AEROSPACE RES INST OF MATERIAL & PROCESSING TECH