Manufacturing method for color filter substrate

A technology for a color filter substrate and a manufacturing method, which is applied to the photoengraving process, optics, optomechanical equipment and other directions of the pattern surface, can solve the problems of disorder, color mixing liquid crystal arrangement, etc., and achieves the effect of good flatness and simple process

Inactive Publication Date: 2016-01-20
TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
View PDF6 Cites 17 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The purpose of the present invention is to provide a method for manufacturing a color filter substrate, which can effectively solve the color mixing problem caused by the free flow of quantum dot glue and the light leakage problem caused by the disordered liquid crystal arrangement, and the obtained color filter substrate is flat better

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Manufacturing method for color filter substrate
  • Manufacturing method for color filter substrate
  • Manufacturing method for color filter substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0037] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0038] see Figure 4 , the invention provides a method for manufacturing a color filter substrate, comprising the following steps:

[0039] Step 1, such as Figure 5 As shown, a substrate 1 is provided, on which a black matrix 2 is formed, and the black matrix 2 surrounds several sub-pixel regions 10 on the substrate 1 .

[0040] Specifically, the substrate 1 is a transparent substrate, preferably a glass substrate.

[0041] Specifically, the several sub-pixel regions 10 include several red sub-pixel regions 11 , several green sub-pixel regions 12 , and several blue sub-pixel regions 13 .

[0042] Step 2, such as Figure 6 As shown, a positive photoresist is coated on the black matrix 2 and the substrate 1 , and a photolithography process ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
Login to view more

Abstract

The invention provides a manufacturing method for a color filter substrate. According to the manufacturing method for the color filter substrate, a light resistance stop wall is formed on a black matrix before quantum dot glue is dropwise added to a sub-pixel area through a positive light resistor to play a stop wall role when the quantum dot glue is dropwise added, and the light resistance stop wall is removed after the stop wall role is played; accordingly, the problems that in an existing manufacturing method for the color filter substrate, color mixing occurs due to free flowing of the quantum dot glue due to the fact that the height of a stop wall is too small, and light leaking occurs due to disorder distribution of liquid crystals due to the fact that the height of the stop wall is too large are solved; the technology is simple, and the flatness degree of the manufactured color filter substrate is better.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for manufacturing a color filter substrate. Background technique [0002] In recent years, with the development of science and technology, liquid crystal display technology has also been continuously improved. TFT-LCD (ThinFilmTransistor-LiquidCrystalDisplay, Thin Film Field Effect Transistor-Liquid Crystal Display) occupies an important position in the display field with its advantages of good image display quality, low energy consumption, and environmental protection, but its color is difficult to cover the complete color gamut. The display technology based on organic light-emitting diode (OLED), which has emerged in recent years, is also increasingly mature. It has a simple structure, thin thickness, fast response speed, and can achieve richer colors. At the same time, with the birth of quantum dots, quantum dot displays also came into being. Due to the extremely na...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02F1/1335
CPCG02F1/133516G02F1/133512G02F1/133617G02F2202/36G03F7/0007G02F1/133357G02F1/133519B41J3/407G02F1/133621G02F1/133302G02F1/133614
Inventor 唐敏
Owner TCL CHINA STAR OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap