Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

A reconfigurable and snoop-proof optical puf

An optical and laser technology, which is applied to record carriers, instruments, computing, etc. used in machines, and can solve the problems of difficult optical PUF reconstruction behavior and inability to prevent prying optical PUFs.

Inactive Publication Date: 2018-10-09
INST OF ELECTRONICS ENG CHINA ACAD OF ENG PHYSICS
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

3. So far, only optical PUF and coated PUF are clearly tamper-resistant. Whether other PUFs can be tamper-proof is still unknown.
However, this structure will fail when the enemy does not use strong laser excitation, so it is difficult to make the enemy's snooping behavior constitute the reconstruction behavior of the optical PUF, and it is impossible to truly realize the anti-snooping optical PUF

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A reconfigurable and snoop-proof optical puf
  • A reconfigurable and snoop-proof optical puf
  • A reconfigurable and snoop-proof optical puf

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] A reconfigurable and snoop-proof optical PUF designed for 500nm wavelength response.

[0027] This optical PUF is as figure 1 As shown, the specific structure fabrication process is as follows:

[0028] 1. The substrate is a gemstone with a thickness of 160 microns.

[0029] 2. Mix ZnO with demineralized water to prepare a ZnO dispersion with a volume fraction of 5% and a nanoparticle size of 200 nm. A magnetic stirrer was used for stirring and dispersing at 1000 rpm for 1 hour, followed by sonication for 10 minutes to prevent the aggregation of ZnO nanoparticles.

[0030] 3. Place the gemstone substrate on a 45° inclined plate, spray the ZnO nanoparticle dispersion with a professional spray gun, and control the thickness of the nano medium through the spraying time.

[0031] 4. Put it at room temperature for one day and wait for the ZnO dielectric layer to solidify and form.

[0032] 5. The ellipsoidal silver nanoparticle dispersion liquid is then configured, and t...

Embodiment 2

[0037] A reconfigurable and spy-proof optical PUF designed for 620nm wavelength response.

[0038] This optical PUF as figure 1 As shown, the specific structure fabrication process is as follows:

[0039] 1. Quartz glass with a thickness of 200 microns can be used as the substrate.

[0040] 2. Mix GaP and demineralized water to prepare a GaP dispersion with a volume fraction of 5% and a nanometer particle size of 200nm. Afterwards, the ellipsoidal silver nanoparticle dispersion is configured, and the particle diameters are fixed at 10 nm with the lengths of the two minor axes, and the lengths of the major axes are respectively 15 nm, 20 nm, 25 nm, 35 nm, and 40 nm. The volume of the dispersion is 1%. Mix it with GaP dispersion. A magnetic stirrer was used to stir and disperse at a rotation speed of 1000 rpm for 1 hour, and then ultrasonicated for 10 minutes to prevent aggregation of silver nanoparticles and GaP nanoparticles.

[0041] 3. Place the gemstone substrate on a ...

Embodiment 3

[0046] A reconfigurable and spy-proof optical PUF designed for 680nm wavelength response.

[0047] This optical PUF as figure 1 As shown, the specific structure fabrication process is as follows:

[0048] 1. A silicon wafer with a thickness of 160 microns can be used as the substrate.

[0049] 2. Put TiO 2 Mix with demineralized water to configure TiO with a volume fraction of 5% and a nanoparticle size of 200nm 2 Dispersions. Afterwards, the ellipsoidal silver nanoparticle dispersion liquid is configured, and the particle diameters are fixed at 10 nm with the lengths of the two minor axes, and the lengths of the major axes are respectively 15, 20, 25, 30, and 40 nm. The volume of the dispersion is 1%. TiO 2 The dispersion is mixed. Use a magnetic stirrer to stir and disperse at a speed of 1000rpm for 1 hour, and then ultrasonic for 10 minutes to prevent silver nanoparticles and TiO 2 Nanoparticle aggregation.

[0050] 3. Place the gemstone substrate on a 45° inclined...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
particle diameteraaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The invention discloses a reconstructive peeping prevention optical PUF. The PUF comprises a substrate, a medium nanometer granular layer growing on the substrate and metal nano particles which have different particle sizes and are randomly doped in the medium nanometer granular layer. Through doping the metal namo particles with the different particle sizes in the medium nano particle scattering layer, by use of the optical absorption selectivity of the metal nano particles with different dimensions, the optical PUF is extremely sensitive to the wavelength of an incident laser; during normal operation and application of a specific wavelength for excitation, the optical PUF generates strong scattering to form a specific speckle pattern for identity authentication; and during application of a laser beyond the specific wavelength, the metal nano particles included in the optical PUF are melted, the microstructure of the PUF is irreversibly damaged, and thus a substantial influence is exerted on the speckle response of the PUF. Therefore, while physical unclonnable feature is obtained, malicious peeping can be effectively prevented, and the microstructure can be reconstructed.

Description

technical field [0001] The present invention relates to the security field based on PUF, in particular to a reconfigurable and anti-snooping optical PUF used in the fields of IP protection, system authentication, trusted computing, secret key generation and the like. Background technique [0002] In recent years, bank cards, credit cards, ID cards and other information have been leaked or stolen by hackers, illegally copied and other incidents have occurred frequently, and it is not uncommon to seek methods to ensure that identity information is not cloned or fraudulently used. It has become the focus of attention. Some solutions, such as EMV smart cards, use embedded chips instead of traditional magnetic stripes to store identity data, but this is still based on mathematical methods, which can still access the information in the memory card and copy or simulate the data, which cannot guarantee the authenticity of the information. Safety. At this time, the physical unclonab...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G06K19/06
CPCG06K19/0615
Inventor 李倩陈飞良李沫龙衡姚尧孙鹏高铭代刚张健
Owner INST OF ELECTRONICS ENG CHINA ACAD OF ENG PHYSICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com