Method for preparing Bi (AlxGa1-x) O3 film through hybrid dissolving of organic sources
An organic source, organic aluminum technology, applied in chemical instruments and methods, gaseous chemical plating, crystal growth, etc., can solve problems affecting the use of PZT, environmental pollution, etc.
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Embodiment 1
[0081] A) Fill the vacuum glove box with nitrogen with a purity of more than 99.9995%, and complete the following operations in the nitrogen atmosphere of the glove box: Weigh triethylaluminum and triethylgallium with a weight ratio of 1:10, dissolve them in xylene In, a solution with a concentration of 0.1M was obtained;
[0082] The three isomers of 45% to 70% m-xylene, 15% to 25% p-xylene and 10% to 15% ortho-xylene (the total ratio is 100% ) mixtures;
[0083] B) Bismuth tris(2,2,6,6-tetramethyl-3,5-heptanedionate) bismuth (III) is used as the organic bismuth source, deionized water is used as the oxygen precursor source, and the purity of the inert gas is more than 99.9995%. The nitrogen gas; the organic bismuth source, the organic aluminum gallium source obtained in step A), the oxygen precursor source, and the nitrogen gas are respectively filled into the organic bismuth source container 1, the organic aluminum gallium source container 2, the oxygen precursor source co...
Embodiment 2
[0117] A) Fill the vacuum glove box with argon with a purity of more than 99.9995%, and complete the following operations in the argon atmosphere of the glove box: Weigh triethylaluminum and triethylgallium with a weight ratio of 1:5, dissolve in In xylene, a solution with a concentration of 0.1M was obtained;
[0118] The three isomers of 45% to 70% m-xylene, 15% to 25% p-xylene and 10% to 15% ortho-xylene (the total ratio is 100% ) mixtures;
[0119] B) The organic bismuth source is triethylbismuth, the oxygen precursor source is deionized water, and the inert gas is nitrogen with a purity of 99.9995% or more; the organic bismuth source, the organic aluminum gallium source obtained in step A), the oxygen precursor source, Nitrogen gas is respectively filled into organic bismuth source container 1, organic aluminum gallium source container 2, oxygen precursor source container 3, and inert gas source container 4, and then installed and connected with respective pipelines;
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Embodiment 3
[0152] A) Fill the vacuum glove box with argon gas with a purity of more than 99.9995%, and complete the following operations in the argon atmosphere of the glove box: Weigh triethylaluminum and triethylgallium with a weight ratio of 1:1, dissolve in In xylene, a solution with a concentration of 0.1M was obtained;
[0153] The three isomers of 45% to 70% m-xylene, 15% to 25% p-xylene and 10% to 15% ortho-xylene (the total ratio is 100% ) mixtures;
[0154] B) The organic bismuth source uses triethyl bismuth, and the oxygen precursor source uses O 2 , O 3 The mixed gas, the inert gas adopts nitrogen with a purity of 99.9995% or more; the organic bismuth source, the organic aluminum gallium source obtained in step A), the oxygen precursor source, and nitrogen are respectively filled into the organic bismuth source container 1 and the organic aluminum gallium source container 2. Oxygen precursor source container 3, inert gas source container 4, and then installed and connected...
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