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Illumination optical device, exposure apparatus, and method of manufacturing article

一种光学设备、光学的技术，应用在照明光学设备,曝光装置和制造物品领域，能够解决照明光学设备尺寸增大、照明面照度恶化等问题

Active Publication Date: 2016-03-30
CANON KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Thus, when such a long optical rod is used, there is a concern that the illuminance of the illuminating surface deteriorates or the size of the entire illuminating optical device increases.

Method used

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  • Illumination optical device, exposure apparatus, and method of manufacturing article
  • Illumination optical device, exposure apparatus, and method of manufacturing article
  • Illumination optical device, exposure apparatus, and method of manufacturing article

Examples

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no. 1 example

[0013] First, an illumination optical device and an exposure apparatus including the illumination optical device according to a first embodiment of the present invention will be described. figure 1 is a schematic diagram showing the configuration of an exposure apparatus 100 and an illumination optical device 101 included in the exposure apparatus 100 . The exposure apparatus 100 is, for example, a projection-type exposure apparatus that is used for photolithography processing in a semiconductor device manufacturing process and exposes (transfers) an image of a pattern formed in a reticle R to a wafer W in a scanning exposure scheme ( substrate). exist figure 1 In each of the subsequent figures, the Z axis is oriented in the normal direction of the wafer W and the X and Y axes are oriented in directions perpendicular to the plane parallel to the plane of the wafer W. The exposure apparatus 100 includes an illumination optical device 101 , a reticle stage 102 , a projection o...

no. 2 example

[0031] Next, an illumination optical device according to a second embodiment of the present invention will be described. image 3 is a schematic diagram showing the configuration of the illumination optical device 201 according to the present embodiment. The same reference numerals are given to the same constituent elements as those of the illumination optical apparatus 101 according to the first embodiment, and description thereof will be omitted. The illumination optical device 201 is characterized in that instead of the first relay lens 3 and the second relay lens 5 employed in the first embodiment, the condenser lens 12 is arranged on the wavelength filter 4 as the beam forming unit according to the present embodiment. (not shown) rear end side. In this case, the light converged at the second focal point position F2 is sequentially transmitted through the wavelength filter 4 and the condenser lens 12 , and is then incident on the optical integrator 6 . The condenser lens...

no. 3 example

[0036] Next, an illumination optical device according to a third embodiment of the present invention will be described. Figure 4 is a schematic diagram showing the configuration of the illumination optical device 301 according to the present embodiment. The same reference numerals are given to the same constituent elements as those of the illumination optical apparatus 101 according to the first embodiment, and description thereof will be omitted. The illumination optical device 301 is characterized in that, instead of the first relay lens 3 and the second relay lens 5 employed in the first embodiment, the diffusion member 13 is placed in the wavelength filter 4 (not shown) as the beam forming unit according to the present embodiment. shown) on the rear end side. In this case, the light converged at the second focal point position F2 is sequentially transmitted through the wavelength filter 4 and the diffusion member 13 , and is then incident on the optical integrator 6 . D...

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Abstract

The present invention relates to an illumination optical device, an exposure apparatus, and a method of manufacturing an article. The illumination optical device for illuminating a plane R to be illuminated using light from a light source, includes: an optical integrator configured to cause an optical intensity distribution to be uniform on an emission end surface by reflecting light incident from an incident end surface in an inside surface a plurality of times; and a light flux forming unit configured to convert a light flux from a focal position where a condensing mirror condenses light from the light source at a first angle with respect to an optical axis directed from the light source to the plane to be illuminated to a light flux to be incident on the incident end surface of the optical integrator at a second angle theta 2 greater than the first angle theta 1 with respect to the optical axis, wherein the plane to be illuminated is illuminated with light from the optical integrator.

Description

technical field [0001] The invention relates to illumination optics, exposure apparatus and methods of manufacturing articles. Background technique [0002] In a photolithography process or the like included in the process of manufacturing a semiconductor device, a pattern formed in an original (for example, a reticle) is transferred to a substrate (for example, on a surface) via a projection optical system or the like. An exposure apparatus on a wafer on which a photoresist layer is formed) is used. The exposure device comprises illumination optics that illuminate the master with a light flux from a light source. Here, when the illumination of the original plate by the illumination optics is not uniform, the transfer of the pattern to the photoresist is insufficient, so that the exposure device may not provide a high-quality device. Furthermore, the throughput of all exposure setups suffers when the illumination optics cannot illuminate the master with high illuminance. ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20G02B27/09
CPCG03F7/70075
Inventor 须田广美
Owner CANON KK