Production technology for single-sided PCB
A technology of PCB board and production process, applied in the field of production process of single-sided PCB board, can solve the problems of complicated production process and high production cost, and achieve the effect of ensuring appearance quality, good quality and high dimensional accuracy
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Embodiment 1
[0037] A production process for a single-sided PCB, comprising the following steps:
[0038] (1) Single-sided copper foil substrate pretreatment: Cut the single-sided copper foil substrate to the required size according to the layout diagram, and then perform surface pickling, surface grinding, water washing and baking on one side of the single-sided copper foil substrate in sequence Dry;
[0039] (2) Line coating exposure treatment: use an ink coating wheel to coat a photosensitive ink layer on the surface of the single-sided copper foil substrate, and perform a baking and drying treatment on the photosensitive ink layer, and finally perform drying on the dried single-sided copper foil substrate. Line film exposure processing;
[0040](3) Line development, etching, and ink removal treatment: place the single-sided copper foil substrate in a developing machine for development treatment, develop redundant lines, and place the single-sided copper foil substrate in an etching ma...
Embodiment 2
[0057] The difference between this embodiment and embodiment 1 is:
[0058] The acidic solution used in the pickling treatment in the step (1) and the step (5) is a sulfuric acid solution with a mass concentration of 4%; the surface grinding treatment in the step (1) and the step (5) uses a 500-mesh nylon mill Brush for scrubbing.
[0059] The thickness of the photosensitive ink layer in the step (2) is 9um, the baking and drying equipment used is a tunnel furnace, the baking temperature is 125°C, and the baking speed is 5m / min; The thickness of the solder resist ink layer is 25um, the baking and drying equipment used is a tunnel furnace, the baking temperature is 105°C, and the baking speed is 5m / min.
[0060] The exposure energy scale is controlled at 8 grids when the line film exposure treatment is performed in the step (2); the exposure energy scale is controlled at 9 grids when the solder resist film exposure treatment is performed in the step (5).
[0061] In the step ...
Embodiment 3
[0068] The difference between this embodiment and embodiment 1 is:
[0069] The acidic solution used in the pickling treatment in the step (1) and the step (5) is a sulfuric acid solution with a mass concentration of 5%; the surface scrubbing treatment in the step (1) and the step (5) uses a 500-mesh nylon mill Brush for scrubbing.
[0070] The thickness of the photosensitive ink layer in the step (2) is 11um, the baking and drying equipment used is a tunnel furnace, the baking temperature is 125°C, and the baking speed is 5m / min; The thickness of the solder resist ink layer is 28um, the baking and drying equipment used is a tunnel furnace, the baking temperature is 105°C, and the baking speed is 5m / min.
[0071] The exposure energy scale is controlled at 8 grids when the circuit film exposure treatment is performed in the step (2); the exposure energy scale is controlled at 10 grids when the solder resist film exposure treatment is performed in the step (5).
[0072] The ma...
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