Ion beam irradiation apparatus, and ion beam current homogenization method

A technology of irradiating device and beam current, which is applied to circuits, discharge tubes, electrical components, etc., to achieve high precision, avoid too large or too small, and improve accuracy
CN105609397AActive Publication Date: 2016-05-25NISSIN ION EQUIP CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Current Assignee / Owner
NISSIN ION EQUIP CO LTD
Publication Date
2016-05-25

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Abstract

The invention provides an ion beam irradiation apparatus (100), being able to perform homogenization of beam current with good stability in a short time. In the uniform control step of homogenization of beam current, the control device performs the steps: a weighting coefficient calculation step: calculating the weighting coefficient that the influence degree of change of each filament current (IF) on each beam current (IB); and a filament theoretical current calculation step: calculating a theoretical current value, approaching the specific targetcurrent value, of each filament for each beam current (IB) according to the weighting coefficient obtained in the weighting coefficient calculation step.
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Description

technical field

[0001] The present invention relates to an ion beam irradiation device and the like for irradiating an ion beam to a wafer or the like. Background technique

[0002] For example, in the manufacturing process of liquid crystal displays and semiconductor devices, ion beam irradiation equipment is used to inject impurity substances such as phosphorus (P) and boron (B) into processed objects such as liquid crystal glass substrates and semiconductor substrates.

[0003] The ion source used in such an ion beam irradiation device includes a plasma generating container in which plasma is generated, and a plurality of filaments provided inside the plasma generating container, and is heated by passing an electric current through each of the filaments to release heat. The electrons collide with the material gas molecules in the plasma generation container to generate plasma, and the plasma is extracted by the extraction electrode system and accelerated into an ion beam....

Claims

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