Preparation method of In-doped MoO3 thin film and application of thin film in QLED
A technology of thin film and indium salt, which is applied in the field of flat panel display, can solve the problems of affecting charge transport and injection, inapplicability, etc., and achieve the effects of reducing injection barrier, improving efficiency, good energy level matching and applicability
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2016-07-20
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Figure 1 Figure 2
Abstract
Description
technical field
[0001] The invention belongs to the field of flat panel display technology, in particular to an In-doped MoO 3 Preparation method of thin film and its application in QLED. Background technique
[0002] In recent years, due to the advantages of high light color purity, high luminous quantum efficiency, adjustable luminous color, and long service life, quantum dot light-emitting diodes (QLEDs) using quantum dot materials as the light-emitting layer have received extensive attention and become a new type of light-emitting diode. The main direction of LED research. Existing QLEDs generally include an anode, a hole injection layer, a hole transport layer, a quantum dot light-emitting layer, an electron transport layer, and a cathode. Wherein, the hole injection layer is used as a functional layer, which can reduce the injection barrier of holes, thereby improving the carrier transfer efficiency.
[0003] PEDOT:PSS (poly(3,4-ethylenedioxythiophene)-polystyrene s...
Examples
Embodiment Construction
[0020] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention clearer, the present invention will be further described in detail below in conjunction with the embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.
[0021] combine figure 1 , the embodiment of the present invention provides an In-doped MoO 3 The preparation method of thin film, comprises the following steps:
[0022] S01. Provide indium salt and MoO 3 , the indium salt and MoO 3 Dissolving in an organic solvent to form a mixed solution, adding an inorganic acid to the mixed solution and then performing heat treatment to obtain a precursor solution, wherein the temperature of the heat treatment is 50-80°C;
[0023] S02. Provide a substrate, deposit the precursor solution on the substrate by a solution processing method, and then perf...