Construction method for nonlinear scalable GaN HEMT model
A high electron mobility and construction method technology, applied in the direction of electrical digital data processing, special data processing applications, instruments, etc., can solve the problems of model inaccuracy, tedious time-consuming, difficult compatibility, etc., to reduce optimization steps, The effect of reducing dependence and avoiding redundant steps
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[0032] specific implementation plan
[0033] The principles and features of the present invention are described below in conjunction with the accompanying drawings, and the examples given are only used to explain the present invention, and are not intended to limit the scope of the present invention.
[0034] This example takes the AlGaN / GaN high electron mobility transistor HEMT device as an example to establish a GaN HEMT nonlinear scalable model.
[0035] refer to figure 1 , an AlGaN / GaN high electron mobility transistor HEMT device, which includes a 2-inch 4H-SiC substrate, a 100nm thick AlN nucleation layer, a 2um thick GaN buffer layer, a 1nm AlN insertion layer, and a 20nm thick non- Doped AlGaN barrier layer, 60nm SiN passivation layer, Ti / Al / Ni / Au ohmic source electrode and ohmic drain electrode, Ni / Au / Ni Schottky gate, where the gate width is 10×100um, and the gate length is 0.25 um, gate-gate, gate-source, gate-drain pitches are 40um, 0.7um and 2.8um respectively....
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