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Method for removing trace moisture in anisole by using carbon monoxide (CO) gas

A carbon monoxide and trace moisture technology, which is applied in ether preparation, organic chemistry, ether separation/purification, etc., can solve the problems of high water content, achieve simple chemical reaction, low energy consumption, and good water removal effect

Inactive Publication Date: 2016-08-10
SHENYANG INSTITUTE OF CHEMICAL TECHNOLOGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Therefore, the side reaction caused by the high water content in the production of boron isotopes by the anisole-boron trifluoride complex method is solved

Method used

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  • Method for removing trace moisture in anisole by using carbon monoxide (CO) gas
  • Method for removing trace moisture in anisole by using carbon monoxide (CO) gas
  • Method for removing trace moisture in anisole by using carbon monoxide (CO) gas

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Embodiment

[0036] Catalyst Preparation: Co-precipitation Method: Preparation of CeO by Co-precipitation Method 2 -Al 2 o 3 catalyst. Al(NO 3 ) 3 ·6H 2 O and Ce (NO 3 ) 3 ·6H 2 The O solution was mixed uniformly according to a certain ratio, stirred rapidly at room temperature, added 4 mol / L ammonia water, adjusted the solution to pH=10, continued to stir for 1.5 h, and stood still for 12 h. Centrifuged and washed three times with a certain amount of deionized water, the obtained precipitate was dried at 333 K for 24 h, and calcined in an air atmosphere of 873 K for 4 h to obtain CeO 2 -Al 2 o 3 Carrier, and tableted and granulated, take 20-40 mesh for later use.

[0037] Preparation of Au / CeO with 1% Gold Loading by Isovolumetric Impregnation 2 -Al 2 o 3 catalyst. Take a certain amount of 2 g / L HAuCl 4 Solution, add dilute KOH solution to adjust its pH to 7-8, add a certain amount of carrier after stabilization, stir evenly, and immerse at room temperature for 12 h. Then...

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Abstract

The invention provides a method for removing trace moisture in anisole by using CO gas. The method is characterized by comprising the following steps: adding an anisole solution containing trace moisture into reactor filled with a catalyst, introducing CO gas with a pressure of 1.0 to 5.0 MPa, controlling reaction temperature to be 150 to 350 DEG C, and allowing CO and trace moisture in anisole to undergo a water-gas shift reaction (CO+H2O=CO2+H2) so as to eventually obtain an anhydrous anisole solution, wherein in the raw materials, the content of anisole is 70 to 99%, and the purity of CO is 10 to 99.99%. The method can remove trace water in anisole liquid; the water gas reaction is mainly utilized in the invention, and introduced CO gas and the trace water in the raw material anisole liquid undergo a reaction to produce gas CO2 and H2 as shown in an equation (6). Thus, the method can overcome side reactions in production of boron isotopes through an anisole-boron trifluoride complex process due to high water content.

Description

technical field [0001] The invention relates to a method for removing trace moisture in anisole, in particular to a method for removing trace moisture in anisole by using carbon monoxide gas (CO). Background technique [0002] In the periodic table, boron is the fifth element, it has two stable isotopes B 10 and B 11 , B 10 The absorption cross-section for thermal neutrons is more than five times that of the natural abundance boron, more than 20 times that of graphite, and more than 500 times that of concrete as a neutron shielding material. It is precisely due to the strong absorption propensity for thermal neutrons that the enrichment of B 10 The material of boron has become a very useful commodity and has been widely used in modern industry and military equipment; especially with the development of nuclear power, its use is increasing; in addition, boron 10 is also used in the treatment of cancer. How to convert B 10 It is separated from natural boron and concentr...

Claims

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Application Information

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IPC IPC(8): C07C43/205C07C41/44
CPCC07C41/44
Inventor 石磊张婉莹孙东
Owner SHENYANG INSTITUTE OF CHEMICAL TECHNOLOGY
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