Coating mechanism, slit coating device and film preparation method
A coating and film-forming technology, which is used in devices for coating liquid on surfaces, coatings, and final product manufacturing. It can solve the problems of high cost and poor film-forming quality, and achieve low cost and easy mass production , the effect of enhancing wettability
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Embodiment 1
[0036] In this embodiment, a coating mechanism 2 is provided, please refer to figure 1 , figure 1 It is the structural diagram of the slit coating device in the embodiment of the present application, such as figure 1 As shown, the coating mechanism 2 includes: a base 200, a pallet 201, a movable support member 202 and a fluid storage tank 240 with a nozzle 210; the pallet 201 and the movable support member 202 are fixed on the on the base 200; wherein, the fluid storage tank 240 is fixed on the movable support member 202, so as to move relative to the pallet 201 driven by the movable support member 202; wherein, in the During the movement of the fluid storage tank 240 , the fluid material in the fluid storage tank 240 is coated onto the sample to be coated fixed on the pallet 201 through the nozzle 210 to directly form a film.
[0037] Specifically, the sample may be one or more of positive electrode sheets or negative electrode sheets.
[0038] In the specific implementation...
Embodiment 2
[0057] In this embodiment, a slit coating device is provided, such as figure 1 As shown, the device includes:
[0058] A horizontal support platform 1; the horizontal support platform 1 is fixed with the coating mechanism 2 provided in the first embodiment, the base material transfer mechanism 3 and the film-forming thermostat box 4;
[0059] Wherein, the base material transfer mechanism 3 is located between the coating mechanism 2 and the film-forming incubator 4, so as to transfer the coated sample to the film-forming incubator 4 for heating to form a film.
[0060] Since the coating mechanism 2 has been introduced in detail in the first embodiment, it will not be repeated here.
[0061] First, the base material transfer mechanism 3 is introduced.
[0062] The main function of the base material transfer mechanism 3 is to realize the clamping, transferring and turning up and down of the sample.
[0063] In the embodiment of this application, as figure 1 and image 3 As s...
Embodiment 3
[0081] In this example, a film preparation method is provided, please refer to Figure 5 , Figure 5 It is a step diagram of the film preparation method in the embodiment of the present application, the method is applied to the slit coating device described in the second embodiment, and the method includes:
[0082] Step S501, the fluid storage tank 240 is moved relative to the pallet 201 driven by the movable support member 202, and the fluid material is uniformly applied to the pallet 201 through the nozzle 210 and fixed on the sample to be coated;
[0083] Step S502, the base material transfer mechanism 3 transfers the coated sample to the film-forming incubator 4;
[0084] Step S503 , heating the coated sample through the film-forming thermostat 4 to form a film on the surface of the sample.
[0085] The following takes the film formation on both sides of the sample as an example to illustrate the method:
[0086] First, the fluid storage tank 240 moves under the drive o...
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