Unlock instant, AI-driven research and patent intelligence for your innovation.

Laser simulation radiation dose rate effect test method for silicon-based semiconductor transistors

A technology of radiation dose rate and test method, applied in the field of radiation effect research of semiconductor devices, can solve the problems of difficult parameter adjustment, low signal-to-noise ratio, and high price.

Inactive Publication Date: 2018-12-28
INST OF ELECTRONICS ENG CHINA ACAD OF ENG PHYSICS
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this type of radiation simulation device has certain limitations, such as limited radiation measurement range, difficult parameter adjustment, radiation damage during the test, large electromagnetic interference, low signal-to-noise ratio, long use reservation cycle, and high price. Applied in the research of radiation effect of laboratory semiconductor devices

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Laser simulation radiation dose rate effect test method for silicon-based semiconductor transistors
  • Laser simulation radiation dose rate effect test method for silicon-based semiconductor transistors
  • Laser simulation radiation dose rate effect test method for silicon-based semiconductor transistors

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] like figure 1 Shown is a step flow of a laser simulation test method for the radiation dose rate of a silicon-based semiconductor transistor.

[0032] (1) Select at least three silicon-based semiconductor transistors of the same model of the same batch and perform unsealing pretreatment; for silicon-based semiconductor transistors with no more than two metal layers, perform front-side unsealing; for silicon-based semiconductor transistors with more than two metal layers The semiconductor transistor should be unsealed from the back; the unsealed silicon-based semiconductor transistor is used as the semiconductor transistor to be tested.

[0033] (2) Observe under a microscope whether the leads of the unpacked semiconductor transistor to be tested are broken. When the leads are not broken, use a multimeter to test whether the transistor function is normal.

[0034] (3) Connect the semiconductor transistor to be tested to the PCB test board. like figure 2 As shown, whe...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a method for testing of laser-simulation radiation dose rate effects of a silicon-based semiconductor transistor. The method comprises the steps that (1) at least three silicon-based semiconductor transistors with the same batch and the same model are selected and processed by a pre-treatment of unsealing, and are then taken as to-be-tested semiconductor transistors; (2) the to-be-tested semiconductor transistors are tested, and normal functions of the transistors are guaranteed; (3) a testing circuit board is welded, and the to-be-tested semiconductor transistors are connected to a testing circuit; (4) a laser beam is irradiated to chips of the to-be-tested transistors; (5) and energy of the laser beam is regulated, and responses of the to-be-tested transistors are tested and then recorded by an oscilloscope. The invention provides a method which can be used for the laser-simulation testing of the radiation dose rate effects of the semiconductor transistor under laboratory conditions. The method has the advantages that a period for anti-radiation reinforcement design is shortened effectively; experimental cost is reduced; an effective method is provided for research of the radiation dose rate effects of a silicon-based semiconductor device; and experimental devices and experimental method are highly valuable for generalization.

Description

technical field [0001] The invention belongs to the research field of radiation effects of semiconductor devices, and mainly relates to a laser simulation test method of the radiation dose rate of silicon-based semiconductor transistors, which can be used in the test of laser simulation of the radiation dose rate of semiconductor devices. Background technique [0002] The instantaneous dose rate radiation effect of semiconductor devices refers to the ionizing radiation damage exhibited by semiconductor devices exposed to instantaneous pulsed γ-ray radiation. The mechanism is that the instantaneous ionizing pulse radiation excites electron-hole pairs in semiconductor materials. These photogenerated carriers will generate instantaneous photocurrent during the process of being collected by the device. When the radiation dose rate increases to a certain extent, the photocurrent may be equal to or even greater than the current signal of the circuit itself, resulting in degradatio...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): G01R31/265
CPCG01R31/2656
Inventor 孙鹏李沫龙衡陈飞良李倩代刚张健
Owner INST OF ELECTRONICS ENG CHINA ACAD OF ENG PHYSICS