Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Bosea sp. AS-1 strain capable of tolerating pollution of arsenic and antimony and oxidizing As(III) and applications thereof

A technology of Baoziella and AS-1, applied in the field of microorganisms, can solve the problems of high cost, secondary pollution, strain tolerance concentration and low oxidation efficiency, and achieve the reduction of arsenic hazards, strong oxidation and adaptability , the effect of strong mobility

Active Publication Date: 2016-09-14
CHINA UNIV OF GEOSCIENCES (WUHAN)
View PDF1 Cites 13 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] At present, there have been some treatment methods for arsenic and antimony pollution, mainly as follows: first, chemical methods, such as chemical precipitation, which have obvious effects, but there are secondary pollution; second, physical methods, such as physical adsorption, this method The cost is high, which is not conducive to large-scale application; the third is the phytoremediation method, planting some plants that can use arsenic to the contaminated site, enriching the arsenic in the plant, and then collecting the plant body and treating it properly, but this method is not suitable Dealing with a large area of ​​polluted environment
The third is the microbial oxidation method. As many researchers have isolated and screened strains with oxidative capacity, the use of microbial oxidation has emerged as the times require and has become a current hot spot, but most strains tolerate low concentrations and oxidation efficiencies

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Bosea sp. AS-1 strain capable of tolerating pollution of arsenic and antimony and oxidizing As(III) and applications thereof
  • Bosea sp. AS-1 strain capable of tolerating pollution of arsenic and antimony and oxidizing As(III) and applications thereof
  • Bosea sp. AS-1 strain capable of tolerating pollution of arsenic and antimony and oxidizing As(III) and applications thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0010] The present invention will be described in detail below in conjunction with specific examples, but the protection scope of the present invention is not limited to the following examples.

[0011] Screening, isolation and identification of strains

[0012] In this embodiment, add a certain concentration of NaAsO from the surface soil polluted by arsenic in Xikuangshan, Hunan Province, China. 2 Carry out enrichment culture, then dilute the enriched cultured soil samples and coat with a certain concentration of NaAsO 2 Arsenic-resistant bacteria were grown on the MMM solid medium plate, and colonies of different shapes were picked and streaked to obtain a single colony, and then inoculated into MMM liquid medium, and KMnO 4 The arsenic-oxidizing bacteria were detected by the method, and the concentrations of As(Ⅲ) and As(Ⅴ) were measured by high-performance liquid chromatography-hydride generation-atomic fluorescence (HPLC-HG-AFS), and the oxidation rate was calculated. ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a Bosea sp. AS-1 strain capable of tolerating pollution of arsenic and antimony and oxidizing As(III). The strain is preserved in the China Center for Type Culture Collection (CCTCC). The address of CCTCC is Wuhan university, Wuhan, China, and the postcode is 430072. The preservation date is April 11st, 2016. The preservation number is CCTCC No.2016190. The 16S rDNA sequence of the strain is represented by SEQ ID No.1. The provided strain is obtained by separating and screening, is capable of oxidizing As (III) into As (V), and thus greatly reduces the harm of As in the environment. The provided AS-1 strain has a strong oxidizing and adapting performance and can be used to treat arsenic pollution.

Description

technical field [0001] The invention relates to a Bouziella strain, which can tolerate and purify high arsenic and antimony pollution, and belongs to the technical field of microbes. Background technique [0002] Arsenic is an element widely present in nature. Long-term exposure can cause a series of diseases, such as skin diseases, cancer, etc. Inorganic arsenic is the most toxic form of arsenic, and generally soil, water, and food contain trace amounts of arsenic. Recent studies have found that the toxicity of arsenic is far greater than previously recognized, with 77 million people in Bangladesh alone exposed to arsenic-containing water. Although arsenic exists in nature in various forms, arsenite (H 3 AsO 3 ) and arsenate (H 3 AsO 4 ). The toxicity of trivalent arsenic is 100 times greater than that of pentavalent arsenic. [0003] Antimony is similar in toxicity to arsenic. Trivalent antimony compounds are more toxic than pentavalent antimony, and can cause hem...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): C12N1/20C02F3/34C12R1/01C02F101/20
CPCC02F3/34C02F2101/20C12R2001/01C12N1/205
Inventor 鲁小璐张旖宁王红梅
Owner CHINA UNIV OF GEOSCIENCES (WUHAN)
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products