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A Multifunctional Vertical Continuous Magnetron Sputtering Coating System

A magnetron sputtering coating and multi-functional technology, which is applied in the directions of sputtering coating, vacuum evaporation coating, ion implantation coating, etc., can solve the problem that the coating line does not achieve multi-functionality, reduce debugging and maintenance time, The effect of process stability and process simplification

Active Publication Date: 2019-01-22
江苏宇天港玻新材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In the prior art, a vertical continuous coating line is used to configure Nb targets on both sides, and Si targets are formed into Nb by reactive sputtering. 2 o 5 +SiO2 2 (Eliding layer) and ITO DC sputtering to complete the function of double-sided shadow-eliminating ITO to meet the needs of TP double-sided ITO sensor, but the metal frame wiring is an indispensable part of the TP sensor structure, the configuration of this coating line It does not meet the multi-functional requirements. If a continuous magnetron sputtering coating system that can produce OGS, single-sided shadow-eliminating ITO, and double-sided shadow-eliminating ITO can be invented, it will bring great convenience to the enterprise. and profit

Method used

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  • A Multifunctional Vertical Continuous Magnetron Sputtering Coating System
  • A Multifunctional Vertical Continuous Magnetron Sputtering Coating System

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] In this embodiment, a touch screen OGS structure can be produced, such as figure 2 As shown, the specific implementation steps are as follows: (1) large plate glass cleaning; (2) BM (black matrix, black frame of cover glass, to prevent light leakage) silk screen printing; (3) ITO coating: this step is as follows figure 2 As shown, it is only required to open all the indium tin oxide targets, and to close all the niobium targets, silicon targets, molybdenum targets, and aluminum targets. In the process room, the large glass sheet is finished with ITO coating, and then the sheet is discharged from the outlet chamber 23; (4) yellow light: the large glass sheet with the ITO film layer is patterned and PI (PI: a negative light Resistance, as an insulating layer for metal bridging; (5) After the PI process is completed, flow to figure 2 In the coating line, Mo+Al+Mo film layer needs to be plated at this time, close the niobium target, silicon target, indium tin oxide targ...

Embodiment 2

[0025] In this embodiment, the coating product of single-sided shadow-eliminating ITO can be produced, such as figure 2 As shown, the specific implementation steps are as follows: (1) large plate glass cleaning; (2) BM (black matrix, black frame of cover glass, to prevent light leakage) silk screen printing; (3) ITO coating: in this step, figure 2As shown, it is only required to turn on the No. 1 ITO target and the No. 2 ITO target, and turn off the No. 3 ITO target and the No. Indium tin oxide target, and close the No. 1 indium tin oxide target and No. 2 indium tin oxide target, and close all the niobium targets, silicon targets, molybdenum targets, and aluminum targets, and load the large plate glass on the carrying trolley (not shown) The sheet enters from the entrance chamber 1, and passes through all the process chambers in turn. The large glass sheet is coated with ITO, and then the sheet is discharged from the exit chamber 23; (4) Yellow light: the large glass sheet w...

Embodiment 3

[0028] In this embodiment, the coating product of double-sided shadow-eliminating ITO can be produced, such as figure 2 As shown, the specific implementation steps are as follows: (1) large plate glass cleaning; (2) BM (black matrix, black frame of cover glass, to prevent light leakage) silk screen printing; (3) ITO coating: in this step, figure 2 As shown, it is only required to turn on the No. 1 ITO target, No. 2 ITO target, No. 3 ITO target, and No. 4 ITO target, and turn off all the niobium targets, silicon targets, molybdenum targets, and aluminum targets. The carrying trolley (not shown) loads large glass sheets into the entrance chamber 1, and passes through all the process rooms in turn. The large glass sheets complete ITO coating, and then complete the output from the exit chamber 23; (4) yellow light: put The large glass sheet with the ITO film layer is patterned and PI (PI: a negative photoresist, used as an insulating layer for metal bridges); (5) passivation (me...

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Abstract

The invention discloses a multifunctional vertical continuous magnetron sputtering coating system which comprises a function area A and a function area B, a bearing trolley, and sequential entrance rooms, a No.1 first-level switch room, a No.1 second-level switch room, a pre-coating speed change room, continuous 15 craft rooms, a post-coating speed change room, a No.2 first-level switch room, a No.2 second-level switch room and an exit room, wherein a molecular pump is arranged on one side of each craft room, and a target is arranged on the other side of the craft room; the target comprises a niobium target, a silicon target, an indium tin oxide target, a molybdenum target and an aluminum target; two molybdenum targets and two aluminum targets are arranged on the same side of the craft room; a coating loading room is arranged on the bearing trolley; an on mode and an off mode are set for each target of the craft room. With the configuration of the coating line, three products of OGS, single-side vanishing ITO and double-side vanishing ITO can be produced, the products are diversified, the process flow is simplified, the labor cost is reduced, the technology is more stable, the debugging and maintenance time is shortened, and the yield is increased.

Description

technical field [0001] The invention relates to the technical field of magnetron sputtering coating, in particular to a multifunctional vertical continuous magnetron sputtering coating system. Background technique [0002] Since the 1980s, magnetron sputtering technology has developed rapidly, and its application fields have been greatly promoted. Now magnetron coating technology plays a pivotal role in the field of coating, and plays a great role in industrial production and scientific fields. , in the TP and display industry, vertical continuous magnetron sputtering coating is particularly important as the upstream of TP sensor processing. [0003] Existing technology as attached figure 1 As shown, the numbers 1-4 in the figure are the inlet chamber, the primary conversion chamber, the secondary conversion chamber, and the transmission chamber before coating, the numbers 5-19 are the process chamber, and the numbers 20-23 are the transmission chamber after coating, and th...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/35C23C14/56C23C14/08C23C14/14
CPCC23C14/086C23C14/14C23C14/568
Inventor 王进东
Owner 江苏宇天港玻新材料有限公司