A strontium stannate-based flexible transparent conductive electrode and preparation method thereof
A transparent conductive electrode and base flexible technology, applied in the direction of cable/conductor manufacturing, conductive layer on insulating carrier, circuit, etc., can solve the problems of affecting the optical performance of transparent conductive film, expensive, easy to be restored, etc., to achieve good application Prospect, excellent electrical conductivity, and the effect of fewer process steps
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Embodiment 1
[0028] The invention discloses a strontium stannate-based flexible transparent conductive electrode, which is specifically prepared by the following preparation method:
[0029] SrSnO 3 Thin film layer deposition: with SrSnO 3 and Ag as the target material into the magnetron sputtering chamber, with PC as the flexible transparent substrate substrate, the distance between the target material and the substrate is controlled to be 100mm, and the background vacuum degree of the magnetron sputtering system is pumped to 5.0× 10 - 4 Pa, 30 sccm of high-purity argon is introduced as the sputtering gas to sputter SrSnO 3 The target material, the sputtering power is 80W, the total sputtering pressure is 1.0 Pa, and the SrSnO is deposited 3 film layer;
[0030] Ag layer deposition: SrSnO 3 After the deposition of the thin film layer is completed, the Ag target is sputtered with argon mixed gas as the sputtering gas, and the Ag layer is sputtered, the sputtering power is 30W, and th...
Embodiment 2
[0033] The invention discloses a strontium stannate-based flexible transparent conductive electrode, which is specifically prepared by the following preparation method:
[0034] SrSnO 3 Thin film layer deposition: with SrSnO 3 and Ag as the target material into the magnetron sputtering cavity, with PET as the flexible transparent substrate substrate, the distance between the target material and the substrate is controlled to be 100mm, and the background vacuum degree of the magnetron sputtering system is pumped to 5.0× 10 -4 Pa, 20 sccm of high-purity argon gas is used as the sputtering gas to sputter SrSnO 3 The target material, the sputtering power is 60W, the total sputtering pressure is 0.5 Pa, and the SrSnO is deposited 3 film layer;
[0035] Ag layer deposition: SrSnO 3 After the deposition of the thin film layer is completed, the Ag target is sputtered with argon mixed gas as the sputtering gas, and the Ag layer is sputtered, the sputtering power is 20W, and the sp...
Embodiment 3
[0038] The invention discloses a strontium stannate-based flexible transparent conductive electrode, which is specifically prepared by the following preparation method:
[0039] SrSnO 3 Thin film layer deposition: with SrSnO 3 and Ag as the target material into the magnetron sputtering cavity, with PEN as the flexible transparent substrate, the distance between the target material and the substrate is controlled to be 120mm, and the background vacuum degree of the magnetron sputtering system is pumped to 5.0× 10 -4 Pa, 20 sccm of high-purity argon gas is used as the sputtering gas to sputter SrSnO 3 The target material, the sputtering power is 20W, the total sputtering pressure is 0.5 Pa, and the SrSnO is deposited 3 film layer;
[0040] Ag layer deposition: SrSnO 3 After the deposition of the thin film layer is completed, use argon gas mixture as the sputtering gas to sputter the Ag target, start sputtering the Ag layer, the sputtering power is 20W, and the sputtering pr...
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Abstract
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Application Information
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