Microwave ionization-based pollution removal system and removal method for dielectric film surface

Abstract

The invention discloses a clearing system and a clearing method based on microwave ionization for surface contamination of a dielectric film layer. The clearing system comprises a sample bin; a microwave source, a vacuum mechanism, a gas flow control system, an oxygen gas source and an inert gas source are arranged on the outer part of the sample bin; the oxygen gas source and the inert gas source are connected with the gas flow control system; and the microwave source, the vacuum mechanism and the gas flow control system communicate with the inner part of the sample bin. According to the system and the method disclosed by the invention, fingerprint contamination on the surface of the dielectric film layer of an optical element is effectively cleaned in a non-contact mode; and meanwhile, the film layer is not damaged, so that performances of the optical element are kept to meet requirements, and therefore, residues are avoided, and secondary pollution is also not caused.

Description

technical field [0001] The invention relates to a system for removing oxygen atoms generated by microwave ionization, in particular to a system and method for removing contamination on the surface of a dielectric film layer based on microwave ionization. Background technique [0002] Since the American physicist Maiman invented the laser in 1960, laser technology has developed rapidly. Compared with traditional light sources, lasers have the advantages of high energy, high monochromaticity, high coherence, and excellent directionality. Various scientific and technical fields have applied lasers and formed a series of interdisciplinary subjects, including information optics and optoelectronics, Laser medical treatment, laser processing, laser detection, laser holography, laser radar, etc. Along with the development of laser technology, modern optics is also born out of the ancient discipline of optics, rejuvenated. People's understanding of optical phenomena continues to de...

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Problems solved by technology

[0006] The technical problem to be solved by the present invention is that the film layer on the surface of the existing optical element is not easy to clean up after being polluted by human fingerprints, and even the film layer will be damaged during cleaning, and there is a risk of residue or secondary pollution during cleaning. A system and method for removing contamination on the surface of a dielectric film layer based on microwave ionization. The system and method can effectively clean the fingerprint pollution on the surface of the dielectric film layer of an optical element in a non-contact manner without causing damage to the film layer and maintain optical quality. The optical performance of the component surface meets the requirements, there will be no residue, and it will not cause secondary pollution

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