Broadband high-isolation low-cross-polarization dual-polarization microstrip antenna array based on SIW technology
A high isolation, microstrip antenna technology, applied in the field of antennas, can solve problems such as port mutual interference, and achieve the effect of increasing antenna capacitance, low profile, and high precision
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0042] This embodiment provides a wideband high-isolation low-cross-polarization dual-polarization microstrip antenna array based on SIW technology, the center frequency is 13.6GHz, and its structure is as follows Figure 1 to Figure 3 As shown, it mainly includes:
[0043]The dielectric substrate 16 is made of Rohacell HF51 foam with a dielectric constant of 1.07 and a thickness of 2.3mm. The top layer of the dielectric 16 is printed with four square parasitic patches 1 with a spacing of 0.75λ and a reflector I2.
[0044] The dielectric substrate 17 is Rogers 5880 with a dielectric constant of 2.2 and a thickness of 0.508mm. The top layer of the dielectric 17 is printed with four square main patches 3 with a spacing of 0.75λ and a reflector II4.
[0045] The dielectric substrate 18 is Rogers 5880 with a dielectric constant of 2.2 and a thickness of 0.254mm. The vertically polarized feeder 5 is printed on the top layer of the dielectric 18 .
[0046] Dielectric substrate 19, ...
PUM
Property | Measurement | Unit |
---|---|---|
Radius | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information

- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com