Preparation method and application of black silicon photocathode

Abstract

The invention provides a preparation method of a black silicon photocathode. The preparation method comprises the following steps: S1, providing a silicon wafer; S2, putting the silicon wafer in a hydrofluoric acid solution for washing, then putting a mixed solution of potassium hydroxide and isopropanol for reacting, finally reacting in the mixed solution of hydrochloric acid and hydrogen peroxide, and manufacturing wool on the surface of the silicon wafer; S3, putting the silicon wafer with manufactured wool in the hydrofluoric acid solution for washing, then putting in a metallic salt solution for reacting, putting the silicon wafer after reaction into a mixed solution of hydrofluoric acid and hydrogen peroxide for reacting, and carrying out etching on a wool surface on the surface of the silicon wafer; and S4, depositing an active thin-film layer on the surface of the silicon wafer after etching so as to obtain the black silicon photocathode, wherein the active thin-film layer comprises one or more of cobalt, nickel, a cobalt compound and a nickel compound. According to the black silicon photocathode in the invention, the active thin-film layer is further deposited on the wool surface of the silicon wafer, so that the photovoltaic conversion performance of the black silicon photocathode can be effectively improved, the optical open-circuit voltage of a photoelectric device is greatly improved, and the photovoltaic conversion efficiency can be increased.

Description

technical field [0001] The invention relates to the technical field of semiconductors, in particular to a preparation method and application of a black silicon photocathode. Background technique [0002] Black silicon is a new type of electronic material discovered by the latest research that can greatly improve the photoelectric conversion efficiency. [0003] Existing silicon cells are all blue and have grids on them. This is because such silicon cells have been passivated. The purpose of passivation is to reduce reflection and remove dangling bonds, so the silicon cells look Still blue and bright. And black silicon is to change the surface color of the original silicon wafer from gray to black. The silicon wafer is still the original silicon wafer, but after the surface of the silicon wafer is processed, some special microstructures are formed, which can greatly reduce the reflection of light, making The silicon wafer looks black. So black silicon is technically more a...

AI Technical Summary

Problems solved by technology

However, black silicon in the prior art still has problems such as low light absorption efficiency and small open circuit voltage when used as a photocathode, which affects the photoelectric performance of semiconductor devices.

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