Preparation method of quartz glass and quartz glass
A technology of quartz glass and compounds, applied in glass manufacturing equipment, glass molding, glass production, etc., can solve problems such as failure to meet semiconductor application requirements, corrosion, and fast corrosion rate
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[0053] like figure 1 Shown, a kind of preparation method of quartz glass that one embodiment of the present invention proposes, it comprises:
[0054] Step 10, using a dissolving agent to dissolve and mix the first doping compound and the second doping compound to form a doping mixed solution, the first doping compound is an aluminum-containing compound, and the second doping compound includes a Zr-containing compound, At least one of Y-containing compounds, La-containing compounds, Sc-containing compounds, Th-containing compounds, V-containing compounds, and Ti-containing compounds;
[0055] Wherein, the dissolving agent can be a kind of dissolving agent, which can dissolve the first doping compound and the second doping compound simultaneously; or, the dissolving agent can include two kinds of dissolving agents, one kind of dissolving agent is used to dissolve the first Doping compound, another dissolving agent is used to dissolve the second doping compound, forming a dopin...
Embodiment 2
[0111] A kind of quartz glass that one embodiment of the present invention proposes, comprises:
[0112] Quartz glass finished product, prepared by the preparation method of said quartz glass finished quartz glass;
[0113] The preparation method of described quartz glass comprises:
[0114] The first doping compound and the second doping compound are dissolved and mixed by a dissolving agent to form a doping mixed solution, the first doping compound is an aluminum-containing compound, and the second doping compound includes a Zr-containing compound and a Y-containing compound , at least one of La-containing compounds, Sc-containing compounds, Th-containing compounds, V-containing compounds, and Ti-containing compounds;
[0115] React silicon dioxide particles from silicon-containing raw materials in a combustion flame at 500-1200°C, deposit the silicon dioxide particles to form a silicon dioxide loose body, and the silicon dioxide loose body has pores;
[0116] Soaking the ...
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