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Ion implantation source with textured interior surfaces

An ion implantation system and ion source technology, applied in ion beam tubes, discharge tubes, electrical components, etc., can solve the problems of rapid and destructive corrosion of ion sources

Inactive Publication Date: 2017-02-22
AXCELIS TECHNOLOGIES
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Stress and delamination of the film tend to cause rapid and destructive corrosion of the inner surfaces of the ion source

Method used

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  • Ion implantation source with textured interior surfaces
  • Ion implantation source with textured interior surfaces
  • Ion implantation source with textured interior surfaces

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Embodiment Construction

[0014] Embodiments of the present invention may be implemented in ion implantation systems that include surfaces on the inner walls of chambers and other internal components (e.g., slotted plates and reflectors) that have textured interior surfaces to reduce plasma confinement. Ion source for membrane delamination. U.S. Application No. 14,135,754, filed January 15, 2014, entitled "Reduced TraceMetal Contamination Source for an Ion Implantation System," U.S. Patent No. 5,497,006 to Sferlazzo et al., and U.S. Patent No. 5,497,006 to Cloutier et al. US Patent No. 5,763,890 is incorporated herein by reference. Application No. 14,135,754 describes one specific example of an ion implantation system in which embodiments of the present invention may be deployed. While this is one exemplary system using an embodiment of the present invention, the textured ion sources described in this disclosure are not limited to this particular environment, but may be used in plasma ion sources and ...

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Abstract

An ion source chamber 132 for an ion implementation system has a textured surfaced to reduce surface film delamination on the interior walls of the ion source chamber. The residual stresses originated from the thermal expansion mismatch due to temperature changes and the tensile residual stress between film and the substrate (liners). The textured feature alters the width to thickness ratio so that it will peel off when it reaches its fracture tensile stress. The machine textures surface increases the mechanical interlocking of the film that builds up on the surface of the ion source chamber, which delays delamination and reduces the size of the resulting flake thereby reducing the likelihood that the flake will bridge a biased component to a ground reference surface and correspondingly increases the life of the ion source 130.

Description

technical field [0001] The present disclosure relates generally to ion implantation systems, and more particularly to a layered ion implantation source having textured surfaces to reduce film buildup on the interior surfaces of the ion source. Background technique [0002] Ion implantation systems, also known as ion implanters, are widely used in the manufacture of integrated circuits and in the manufacture of flat panel displays to dope impurities into semiconductors. In these systems, a dopant gas is introduced into an ion source that includes a plasma confinement chamber in which the gas is excited into an ionized plasma state. An ion beam is extracted from the chamber by a magnetic or electric field and directed onto the workpiece to implant doping elements into the workpiece. In computer chip fabrication, for example, ion beams are passed across the surface of a silicon wafer to create regions with the necessary conductivity for making transistors and other integrated ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01J27/20H01J37/08H01J37/317
CPCH01J27/205H01J37/08H01J37/3171H01J2237/061H01J2237/0213
Inventor 奈尔·卡尔文谢泽仁
Owner AXCELIS TECHNOLOGIES