Narrow-band absorption superconducting nanowire single photo detector
A single-photon detector and superconducting nanowire technology, which is applied in the field of light detection, can solve the problems of low absorption efficiency, performance degradation of superconducting nanowire single-photon detector, influence of absorption efficiency, etc., so as to avoid the influence of absorption efficiency, The effect of improving the detection efficiency of the device and suppressing the dark count
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Embodiment 1
[0051] Such as image 3 As shown, this embodiment provides a narrowband absorption superconducting nanowire single photon detector, including:
[0052] substrate 20;
[0053] A high reflection film 21 located on the surface of the substrate 20;
[0054] Superconducting nanowires 22, located on the surface of the high reflection film 21;
[0055] The multilayer thin film filter 23 is located on the surface of the high reflection film 21 , and the bottom thin film layer of the multilayer thin film filter 23 covers the superconducting nanowire 22 .
[0056] As an example, the narrow-band absorbing superconducting nanowire single photon detector of this embodiment is a superconducting nanowire single photon detector with a front-incidence structure.
[0057] As an example, the substrate 20 includes a silicon substrate, an MgO substrate or a sapphire substrate, and the thickness of the substrate 20 is 300-500 microns. In this embodiment, the substrate 20 is a silicon substrate ...
Embodiment 2
[0068] Such as Figure 5 As shown, this embodiment also provides a narrow-band absorbing superconducting nanowire single-photon detector. The basic structure of the narrow-band absorbing superconducting nanowire single-photon detector in this embodiment is basically the same as that in Embodiment 1. The difference between the two is : The multilayer thin film filter 23 described in Embodiment 1 is an alternately stacked SiO 2 Thin film layer 211 with TiO 2 thin film layer 213; and the multilayer thin film filter 23 described in this embodiment is an alternately stacked SiO 2 Thin film layer 211 and Ta 2 o 5 film layer 214 . The multilayer thin film filter 23 can be the SiO 2 The thin film layer 211 is located on the surface of the high reflection film 21, and the Ta 2 o 5 Thin film layer 214 is located on the SiO 2 Above the thin film layer 211; also can be as Figure 5 Ta 2 o 5 The thin film layer 214 is located on the surface of the high reflection film 21, and th...
Embodiment 3
[0070] Such as Figure 6 As shown, this embodiment provides a narrow-band absorbing superconducting nanowire single-photon detector. The basic structure of the narrow-band absorbing superconducting nanowire single-photon detector in this embodiment is basically the same as that of Embodiment 1. The difference between the two is: The high reflection film 21 described in Example 1 is alternately stacked SiO 2 thin film layer 211 and Si thin film layer 212, and the high reflection film 21 described in this embodiment is an alternately stacked SiO 2 Thin film layer 211 with TiO 2 Thin film layer 213; the multilayer thin film filter 23 described in embodiment 1 is SiO stacked alternately 2 Thin film layer 211 with TiO 2 thin film layer 213; and the multilayer thin film filter 23 described in this embodiment is an alternately stacked SiO 2 thin film layer 211 and Si thin film layer 212 . The high reflection film 21 can be the SiO 2 The thin film layer 211 is located on the sur...
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