A preparation method of high-purity yttrium oxide coating for key parts of IC equipment

A technology of yttrium oxide and components, which is applied in the field of preparation of high-purity yttrium oxide coatings for key components of IC equipment, can solve the problems of large heat input, easy oxidation, and poor coating quality of aluminum alloy sprayed substrates, and achieve Improve the service life and production efficiency, eliminate oxidation, the effect of dense coating

Active Publication Date: 2019-05-03
SHENYANG FORTUNE PRECISION EQUIP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The object of the present invention is to provide a kind of preparation method that adopts cold spray technology to prepare IC equipment key parts and components to use high-purity yttrium oxide coating, solve the poor coating quality that exists when existing plasma etc. thermal spraying technology prepares yttrium oxide coating, Easy to oxidize, and lead to excessive heat input of aluminum alloy spraying substrate, open up a new effective way to prepare high-purity yttrium oxide coating, in order to expand the scope of practical application as soon as possible

Method used

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  • A preparation method of high-purity yttrium oxide coating for key parts of IC equipment
  • A preparation method of high-purity yttrium oxide coating for key parts of IC equipment
  • A preparation method of high-purity yttrium oxide coating for key parts of IC equipment

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Experimental program
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Embodiment 1

[0036] Cold spraying process parameters: powder feeding gas temperature 600°C, powder feeding gas pressure 2MPa, powder moving speed 1000m / min, spraying distance 20mm, powder feeding rate 100g / min, 4 passes; substrate: 6061 aluminum alloy; The coating thickness obtained after spraying is about 120 μm.

[0037] (1) XRD analysis:

[0038] Such as figure 1 As shown, Y after spraying 2 o 3 Compared with the original powder, the composition of the coating has not changed.

[0039] (2) Surface roughness measurement:

[0040] The average roughness Ra of the cold sprayed coating on the 6061 aluminum alloy substrate is 9.090 μm;

[0041] (3) Surface morphology SEM photos:

[0042] As shown in Figure 2(a)-(b), the surface morphology of the 6061 aluminum alloy substrate;

[0043] (4) Cross-sectional metallographic photos:

[0044] As shown in Figure 3(a)-(b), from Y 2 o3 The metallographic photograph of the coating / 6061 substrate section shows that the coating is well bonded to ...

Embodiment 2

[0046] The difference from Example 1 is that

[0047] Cold spraying process parameters: powder feeding gas temperature 500°C, powder feeding gas pressure 4MPa, powder moving speed 800m / min, spraying distance 20mm, powder feeding rate 80g / min, 6 passes; substrate: 6061 aluminum alloy; The coating thickness obtained after spraying is about 100 μm.

[0048] As shown in Figure 4(a), the surface morphology of the 6061 aluminum alloy substrate; as shown in Figure 4(b), from Y 2 o 3 The metallographic photograph of the coating / 6061 substrate cross-section shows that the coating is well bonded to the substrate and the microstructure is evenly distributed.

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Abstract

The present invention relates to the field of cold spraying preparation of ceramic coatings, more particularly to a preparation method of a high-purity yttrium oxide coating for IC equipment critical parts. The method mainly comprises: (1) protecting the coating-free area on a part; (2) carrying out surface pretreatment on the sprayed area of the part; (3) using high-purity yttrium oxide powder, wherein the purity is more than or equal to 99.9 wt%, and the average particle size is 2-50 [mu]m; and (4) carrying out rapid spray coating by using a low-pressure cold spray coating system to obtain the high-purity yttrium oxide coating. Compared to the traditional hot spray coating, the cold spray coating of the present invention can effectively reduce and decrease the heat input to the substrate, such that the cold spray coating is suitable for the spraying of the coating on the surface of the aluminum, the aluminum alloy and other IC equipment critical parts. According to the present invention, the spray coating temperature of the used cold spray coating method is only 100-1000 DEG C, and is much lower than the temperature required by the plasma spraying (the melting temperature of the yttrium oxide is more than 2410 DEG C); and the yttrium oxide coating prepared through the cold spraying has characteristics of stable quality and uniform thickness.

Description

technical field [0001] The invention relates to the field of ceramic coatings prepared by cold spraying, in particular to a method for preparing high-purity yttrium oxide coatings for key components of IC equipment. Background technique [0002] For IC equipment companies, the supply of components determines the process of their research and development and industrialization. The development of the IC equipment industry is unimaginable without the supply of components that meet the process requirements of IC equipment companies. Breakthroughs in the integrated manufacturing technology of representative IC equipment high-end components and key components can solve the localization of 70% of IC equipment components. The establishment of a public service platform for special precision components of IC equipment in China plays a vital role in the development and industrialization of IC equipment in my country. [0003] As 22nm technology has been gradually used in mass product...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C24/04
CPCC23C24/04
Inventor 熊天英沈艳芳杨阳宋婉冯博吴杰吴中泽侯涛李茂程刘伟杰郁忠杰唐伟东
Owner SHENYANG FORTUNE PRECISION EQUIP CO LTD
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