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Light direct-writing imaging equipment and system

An imaging device and light source technology, applied in the field of lithography, can solve problems such as affecting the exposure effect, and achieve the effects of improving the exposure effect, reducing stray light, and improving reliability.

Inactive Publication Date: 2017-05-10
TIANJIN JINXIN MICROELECTRONICS TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, during this period, the light source of continuous light has been irradiated on the micromirror of the DMD, which has brought its technical problems: in the transition process, the light source has been turned on, and the light reflected by the micromirror will be projected into the imaging lens barrel and become stray light. The part of stray light projected on the substrate will affect the exposure effect

Method used

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  • Light direct-writing imaging equipment and system
  • Light direct-writing imaging equipment and system
  • Light direct-writing imaging equipment and system

Examples

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Embodiment 1

[0036] Such as figure 1 As shown, the optical direct writing imaging device 1 provided by the embodiment of the present invention includes a precision displacement platform 2, a precision displacement platform controller 3, a spatial light modulator 4, a spatial light modulator control module 5, a light source 6 and a light source controller 7 .

[0037] In this embodiment, the precision displacement platform controller 3 is used to control the movement of the precision displacement platform 2 in a step motion in the horizontal X-axis direction and a uniform linear motion in the longitudinal Y-axis direction. The precision displacement platform 2 carries the substrate to be exposed, and the substrate is located on the best focal plane of the optical direct writing imaging device 1. After the precision displacement platform 2 moves at a constant speed into the set trigger signal window, it moves along the Y-axis direction at every interval. The precision displacement platform cont...

Embodiment 2

[0046] Such as image 3 As shown, the optical direct writing imaging system 10 provided by the embodiment of the present invention includes a main control computer 11, a light receiving module 12, an imaging lens 13, and the optical direct writing imaging device provided in the first embodiment. 10 When exposure is to be made, the control system built into the main control computer 11 sends the rasterized data to be exposed to the spatial light modulator control module 5. The spatial light modulator control module 5 stores the data to be exposed in its own memory. The data has been stored in frames in the order to be exposed. After the exposure data is stored, the main control computer 11 sends the motion instructions of the precision displacement platform 2 to the precision displacement platform controller 3, and controls the precision displacement platform 2 to drive the substrate movement. The movement mode is a step movement in the horizontal axis X direction. The Y directi...

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Abstract

The invention provides light direct-writing imaging equipment and system, and relates to the technical field of photoetching. The light direct-writing imaging equipment comprises a precision displacement platform, a precision displacement platform controller, a spatial light modulator, a spatial light modulator control module, a light source and a light source controller, wherein the precision displacement platform controller is used for respectively outputting a pulse signal to the spatial light modulator control module and the light source controller when the precision displacement platform moves a set trigger distance, the spatial light modulator control module is used for controlling an internal lens device of the spatial light modulator to run a transition process in a fixed time according to a trigger edge of the pulse signal received every time, and the light source controller is used for controlling the light source to give out duty ratio of pulse light according to the trigger edge of the pulse signal received every time. By the light direct-writing imaging equipment, the transition process of micromirror turnover of the lens device is achieved, the output of the light source is closed, the stray light of the imaging system is reduced, and the exposure effect of a printed circuit board is improved.

Description

Technical field [0001] The present invention relates to the field of lithography technology, in particular to an optical direct writing imaging device and system. Background technique [0002] Photolithography is used to print patterns with features on the surface of a substrate. Such substrates may include those used to manufacture semiconductor devices, various integrated circuits, flat-panel displays (such as liquid crystal displays), circuit boards, biochips, and micromachines. Chips such as electronic chips and optoelectronic circuit chips. [0003] At present, most printed circuit board (PCB) direct light imaging systems use continuous light sources, and the use of pulsed light sources must match the frequency of the spatial light modulator. At present, in the non-masked continuous light direct imaging system of the printed circuit board, the spatial light modulator is mostly based on the digital micro mirror device (Digital Micro mirror Device, referred to as DMD). The subs...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70383G03F7/7055
Inventor 王喜宝
Owner TIANJIN JINXIN MICROELECTRONICS TECH CO LTD
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