Light direct-writing imaging equipment and system
An imaging device and light source technology, applied in the field of lithography, can solve problems such as affecting the exposure effect, and achieve the effects of improving the exposure effect, reducing stray light, and improving reliability.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0036] Such as figure 1 As shown, the optical direct writing imaging device 1 provided by the embodiment of the present invention includes a precision displacement platform 2, a precision displacement platform controller 3, a spatial light modulator 4, a spatial light modulator control module 5, a light source 6 and a light source controller 7 .
[0037] In this embodiment, the precision displacement platform controller 3 is used to control the movement of the precision displacement platform 2 in a step motion in the horizontal X-axis direction and a uniform linear motion in the longitudinal Y-axis direction. The precision displacement platform 2 carries the substrate to be exposed, and the substrate is located on the best focal plane of the optical direct writing imaging device 1. After the precision displacement platform 2 moves at a constant speed into the set trigger signal window, it moves along the Y-axis direction at every interval. The precision displacement platform cont...
Embodiment 2
[0046] Such as image 3 As shown, the optical direct writing imaging system 10 provided by the embodiment of the present invention includes a main control computer 11, a light receiving module 12, an imaging lens 13, and the optical direct writing imaging device provided in the first embodiment. 10 When exposure is to be made, the control system built into the main control computer 11 sends the rasterized data to be exposed to the spatial light modulator control module 5. The spatial light modulator control module 5 stores the data to be exposed in its own memory. The data has been stored in frames in the order to be exposed. After the exposure data is stored, the main control computer 11 sends the motion instructions of the precision displacement platform 2 to the precision displacement platform controller 3, and controls the precision displacement platform 2 to drive the substrate movement. The movement mode is a step movement in the horizontal axis X direction. The Y directi...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com



