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Pretreatment liquid for TFT glass thinning process

A pretreatment solution, 1. TFT technology, applied in the field of TFT glass thinning process pretreatment solution, can solve the problems of glass substrate scrapping, over-etching, waste liquid difficult to handle, etc., and achieve good pretreatment effect

Active Publication Date: 2017-05-31
JIANGSU JIANDAEN ELECTRONICS SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the production of ultra-thin TFT (Thin Film Transistor, thin film transistor) liquid crystal display, it is necessary to carry out thinning treatment on the glass substrate (referred to as TFT glass) after packaging. Local over-etching pits often occur, requiring long-term polishing, and even causing the entire glass substrate to be scrapped
In order to solve this problem, in the prior art, the pretreatment liquid prepared on the basis of concentrated sulfuric acid is used to pretreat the glass substrate of the liquid crystal screen before the thinning treatment. Due to the addition of a large amount of concentrated sulfuric acid, the waste liquid produced after the pretreatment process Difficult to handle

Method used

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  • Pretreatment liquid for TFT glass thinning process
  • Pretreatment liquid for TFT glass thinning process

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Embodiment Construction

[0012] Provided by the present invention is used for TFT glass surface pretreatment liquid, prepares with following method,

[0013] 1) Mix the prescribed amount of hydrochloric acid and hydrofluoric acid, and add appropriate amount of water to dilute,

[0014] 2) Dissolve the prescription amount polyethylene glycol in 30-40% water of the prescription amount,

[0015] 3) dissolving the prescribed amount of sulfobutyl-β-cyclodextrin in water and adding the prescribed amount of sodium alginate;

[0016] 4) In the mixed solution of step 3), slowly add the mixed solution of step 2) and step 1) successively under vigorous stirring, make up the remaining water and stir until mixed evenly.

[0017] Embodiment 1~4 formula sees the following table (mass percentage wt%)

[0018]

[0019] The method of carrying out thinning pretreatment to the pretreatment liquid that embodiment 1~4 obtains is as follows

[0020] The raw materials used are the same batch of glass panels used for TF...

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Abstract

The invention provides pretreatment liquid for a thin film transistor (TFT) glass thinning process. The pretreatment liquid is characterized in that the pretreatment liquid comprises the following components in percentages by mass: 10-15% of HCl, 2-5% of HF, 1-2% of sulfobutyl ether-beta-cyclodextrin, 0.1-0.2% of sodium alginate, 5-6% of polyethylene glycol 6000, and the balance being water.

Description

technical field [0001] The invention relates to a composition used for etching pretreatment of liquid crystal display glass substrates. Background technique [0002] In the production of ultra-thin TFT (Thin Film Transistor, thin film transistor) liquid crystal display, it is necessary to carry out thinning treatment on the glass substrate (referred to as TFT glass) after packaging. Local over-etching pits often occur, requiring a long-term polishing process, and even causing the entire glass substrate to be scrapped. In order to solve this problem, in the prior art, the pretreatment liquid prepared on the basis of concentrated sulfuric acid is used to pretreat the glass substrate of the liquid crystal screen before the thinning treatment. Due to the addition of a large amount of concentrated sulfuric acid, the waste liquid produced after the pretreatment process Difficult to handle. Therefore, it is an urgent problem to be solved in the prior art to provide a new product ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C03C15/00
CPCC03C15/00
Inventor 庞绮琪
Owner JIANGSU JIANDAEN ELECTRONICS SCI & TECH
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